2021
DOI: 10.1016/j.apsusc.2021.149245
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Investigation of GaAs surface treatments for ZnSe growth by molecular beam epitaxy without a buffer layer

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Cited by 10 publications
(4 citation statements)
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“…The 450 nm should be corresponding to the band gap of ZnSe while the 650 nm is contributed by defect energy level. 41 The curves of the composites are similar to that of CuSe except that the absorption intensity shows some as different. As the ratio of ZnSe increases, the absorption intensity decreases more or less.…”
Section: Xps and Uv−vis Drsmentioning
confidence: 65%
See 1 more Smart Citation
“…The 450 nm should be corresponding to the band gap of ZnSe while the 650 nm is contributed by defect energy level. 41 The curves of the composites are similar to that of CuSe except that the absorption intensity shows some as different. As the ratio of ZnSe increases, the absorption intensity decreases more or less.…”
Section: Xps and Uv−vis Drsmentioning
confidence: 65%
“…The absorption curve of ZnSe shows two obvious steps at 450 and 650 nm. The 450 nm should be corresponding to the band gap of ZnSe while the 650 nm is contributed by defect energy level . The curves of the composites are similar to that of CuSe except that the absorption intensity shows some as different.…”
Section: Resultsmentioning
confidence: 86%
“…Mudiyanselage et al utilized in situ AES to quantitatively monitor elemental flux ratios during growth, providing valuable insight into the growth process [23] . Madisetti et al employed AES to monitor the removing traces of carbon and oxides on the surface by heating the samples to a high temperature of 850 °C for 1 h [180] . Zhang et al used AES to investigate the effect of different surface cleanliness on GaAs growth [181] .…”
Section: Other Spectroscopic Techniquesmentioning
confidence: 99%
“…[ 16 ] 3) The conduction band offset between buffer layer and absorber layer should be spike‐like Type‐II heterojunction and less than 0.4 eV. [ 22–24 ] The currently developed alternative binary buffer layer materials, such as ZnO, [ 17 ] ZnS, [ 18 ] ZnSe, [ 19 ] In 2 S 3 , [ 20 ] MoS 2 , [ 21 ] and so on. These binary buffer layer materials have the characteristics of simple preparation process and flexible application structure.…”
Section: Introductionmentioning
confidence: 99%