Investigation of ECR plasma uniformity from the point of view of production and confinement

Itagaki, Naho; Yoshizawa, Takenori; Ueda, Yôko; Kawai, Yoshinobu

doi:10.1016/s0040-6090(00)01635-7

Cited by 7 publications

(5 citation statements)

References 13 publications

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“…The mean ion charge state is high because of the high collision frequency between the electrons and ions. However, the plasma distribution is not very uniform and the electron temperature is larger than that of the ion [23][24][25].…”

Section: Gaseous Plasma Sourcesmentioning

confidence: 99%

Plasma-surface modification of biomaterials

Chu

Chen

Wang

et al. 2002

Materials Science and Engineering: R: Reports

1,402

652

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Plasma-surface modification (PSM) is an effective and economical surface treatment technique for many materials and of growing interests in biomedical engineering. This article reviews the various common plasma techniques and experimental methods as applied to biomedical materials research, such as plasma sputtering and etching, plasma implantation, plasma deposition, plasma polymerization, laser plasma deposition, plasma spraying, and so on. The unique advantage of plasma modification is that the surface properties and biocompatibility can be enhanced selectively while the bulk attributes of the materials remain unchanged. Existing materials can, thus, be used and needs for new classes of materials may be obviated thereby shortening the time to develop novel and better biomedical devices. Recent work has spurred a number of very interesting applications in the biomedical field. This review article concentrates upon the current status of these techniques, new applications, and achievements pertaining to biomedical materials research. Examples described include hard tissue replacements, blood contacting prostheses, ophthalmic devices, and other products. #

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Section: Gaseous Plasma Sourcesmentioning

confidence: 99%

Plasma-surface modification of biomaterials

Chu

Chen

Wang

et al. 2002

Materials Science and Engineering: R: Reports

1,402

652

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“…To summarize, the scheme coupled with the utilization of highly efficient ECR sources has resulted in the production of high-volume, relatively high-density plasma (~10 11 cm −3 ), even though ECR sources are not known to scale well with volume [19][20][21][22][23][24][25][26]. This uniform, high-density plasma over a large volume at low power (a few hundred watts per source) can become an efficient plasma processing system in the near future.…”

Section: Discussionmentioning

confidence: 99%

“…Unlike most other configurations [20][21][22][23][24][25][26], the present scheme [27,28] utilizes multiple plasma sources placed on the periphery of a large volume cylindrical chamber of diameter D (figure 1) to produce high-density plasma. In order to distribute the sources, the system has M source planes, each having a suitable number of source ports (4, 6, 8, ..., 2N) located in a symmetric manner on the chamber on which the plasma sources are mounted.…”

Section: The Schemementioning

confidence: 99%

“…Although ECR has been used for various industrial applications [18,19], its use has been limited by the fact that ECRproduced plasmas do not scale well with volume [19][20][21][22][23][24][25][26] due to the small wavelength of microwaves. Inside an ECR source, microwaves propagate in a particular mode and are absorbed into the ECR zone to produce plasma.…”

Section: Introductionmentioning

confidence: 99%

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Studies on plasma production in a large volume system using multiple compact ECR plasma sources

Tarey

Ganguli

Sahu

et al. 2016

Plasma Sources Sci. Technol.

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This paper presents a scheme for large volume plasma production using multiple highly portable compact ECR plasma sources (CEPS) (Ganguli et al 2016 Plasma Source Sci. Technol. 25 025026). The large volume plasma system (LVPS) described in the paper is a scalable, cylindrical vessel of diameter ≈1 m, consisting of source and spacer sections with multiple CEPS mounted symmetrically on the periphery of the source sections. Scaling is achieved by altering the number of source sections/the number of sources in a source section or changing the number of spacer sections for adjusting the spacing between the source sections. A series of plasma characterization experiments using argon gas were conducted on the LVPS under different configurations of CEPS, source and spacer sections, for an operating pressure in the range 0.5-20 mTorr, and a microwave power level in the range 400-500 W per source. Using Langmuir probes (LP), it was possible to show that the plasma density (~1 − 2 × 10 11 cm −3 ) remains fairly uniform inside the system and decreases marginally close to the chamber wall, and this uniformity increases with an increase in the number of sources. It was seen that a warm electron population (60-80 eV) is always present and is about 0.1% of the bulk plasma density. The mechanism of plasma production is discussed in light of the results obtained for a single CEPS (Ganguli et al 2016 Plasma Source Sci. Technol. 25 025026).

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“…Ions can penetrate the material surface to a depth of from several tens of nm up to as much as about 10 5 nm; the ions are buried in the material to directly change the composition and material structure (ion implantation) or to combine with other species to form thinˆlms (such as ion beam assisted deposition or plasma immersion ion implantation and deposition). Detailed descriptions of these techniques can be found in the literature [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16] . This paper will focus on the applications of plasma and ion beam processing to the biomaterialsˆeld.…”

Section: Introductionmentioning

confidence: 99%

Biomedical Applications of Plasma and Ion Beam Processing

et al. 2008

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Surface modiˆcation using plasma and ion beam processing can signiˆcantly change the chemical and physical characteristics of biomaterial surfaces, such as their structure, composition, surface wettability, electrical properties, mechanical properties, electrochemical properties, etc. This kind of surface processing, sometimes in combination with other techniques such as chemical or biochemical methods, can be used to form novel biomaterial surfaces that are anticoagulant, antibacterial, bioactive, biomimetic, wear resistant, and more. In this paper we describe the application of plasma and ion beam processing to thê eld of biomedical materials.

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Investigation of ECR plasma uniformity from the point of view of production and confinement

Cited by 7 publications

References 13 publications

Plasma-surface modification of biomaterials

Plasma-surface modification of biomaterials

Studies on plasma production in a large volume system using multiple compact ECR plasma sources

Biomedical Applications of Plasma and Ion Beam Processing

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