2016
DOI: 10.1063/1.4948238
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Investigation of dopant clustering and segregation to defects in semiconductors using atom probe tomography

Abstract: The role of atom probe tomography in the investigation of clustering and segregation of dopants to lattice defects in semiconductors is highlighted on the basis of some selected salient illustrations obtained at the Groupe de Physique des Matériaux of Rouen (France). The instrument is shown to be able to map out the 3D distribution of chemical species in the three dimensions of space at the ultimate scale. Results related to clustering, segregation of dopants (As, B, and P) to grain boundaries, dislocation loo… Show more

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Cited by 11 publications
(10 citation statements)
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“…We reasoned there is an alternate possibility: the dopants in the films may be heterogeneously distributed in the thin films as nanoscopic clusters similar to the nanoscopic charged regions in a contact electrified sample 47 . Dopant clusters have been observed in inorganic semiconductors 48 but are not commonly invoked in organic semiconductors as they are often doped in solution 49 . We then hypothesized that doping temperature alters the clustering of the dopants and thus the shape of the DOS, which in turn alters the relationship between the Seebeck coefficient and electrical conductivity.…”
Section: Resultsmentioning
confidence: 99%
“…We reasoned there is an alternate possibility: the dopants in the films may be heterogeneously distributed in the thin films as nanoscopic clusters similar to the nanoscopic charged regions in a contact electrified sample 47 . Dopant clusters have been observed in inorganic semiconductors 48 but are not commonly invoked in organic semiconductors as they are often doped in solution 49 . We then hypothesized that doping temperature alters the clustering of the dopants and thus the shape of the DOS, which in turn alters the relationship between the Seebeck coefficient and electrical conductivity.…”
Section: Resultsmentioning
confidence: 99%
“…The modulation of material properties through microscopic manipulation of GB properties in terms of segregation engineering does not only work for metallic systems [5][6][7], but also for semiconductors, e.g. Si-based materials [8][9][10][11][12]. The alien elemental doping plays an important role in modulating the electrical properties of Si-based nano-devices [13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%
“…Phosphorous (P) and arsenic (As), as important n-type dopants, are usually ion implanted in Si wafers for nano-scale semiconductor applications [20][21][22][23][24]. One typical example is the metal-oxide semiconductor field effect transistor (MOSFET) [12,19,25]. The uniformity of doping elements is important for the electrical parameters of these Si-based microelectronic devices [25,26].…”
Section: Introductionmentioning
confidence: 99%
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“…A plethora of information about the (matrix and dopant) concentration and spatial distribution of atoms, segregation at interfaces and defects, solute clustering, etc. [2]- [5], can be extracted with APT, ultimately enabling a local assessment of various parameters that are critical to device development and which require precise control.…”
Section: Introductionmentioning
confidence: 99%