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2021 IEEE 71st Electronic Components and Technology Conference (ECTC) 2021
DOI: 10.1109/ectc32696.2021.00263
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Investigation of Copper and Glass Interaction in Through Glass Via (TGV) During Thermal Cycling

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Cited by 18 publications
(4 citation statements)
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“…Thin and small features such as C4, thermal interface material (TIM), and through silicon via make it impractical to use detailed models of microelectronic packages in board-level simulation (Pan et al , 2021; Yang et al , 2021). The compact model approach based on thermophysical property simplifications is used to eliminate these small features (Lasance, 2008).…”
Section: Computational Fluid Dynamics Model and Validationmentioning
confidence: 99%
“…Thin and small features such as C4, thermal interface material (TIM), and through silicon via make it impractical to use detailed models of microelectronic packages in board-level simulation (Pan et al , 2021; Yang et al , 2021). The compact model approach based on thermophysical property simplifications is used to eliminate these small features (Lasance, 2008).…”
Section: Computational Fluid Dynamics Model and Validationmentioning
confidence: 99%
“…In addition, the failure mechanism and optimization rule of TGV interposer architecture were systemically investigated [ 11 , 12 , 13 , 14 , 15 , 16 , 17 , 18 , 19 ]. Tensile radial and circumferential stresses were attributed to the origin of the circumferential cracks and the formation of radial cracks, respectively [ 11 , 13 , 14 ].…”
Section: Introductionmentioning
confidence: 99%
“…Tensile radial and circumferential stresses were attributed to the origin of the circumferential cracks and the formation of radial cracks, respectively [11,13,14]. Different annealing procedures were designed to study their influence on Cu protrusion mechanisms [12,15], and Cu protrusion was observed to saturate after a dwell time of 4 h with an annealing temperature of 400 • C. Irreversible Cu protrusion of Cu-filled TGV was generated after thermal cycling loading and is attributed to the plastic deformation and creep mechanism of Cu [16]. Different layout designs, such as fully filled via and conformal via, were demonstrated and investigated in terms of their thermomechanical reliability [17].…”
Section: Introductionmentioning
confidence: 99%
“…A specific failure of radial and circumferential cracks has been separately observed and attributed to the stress buildup during the heating and cooling process in the annealing heat treatment procedure [ 12 , 13 ]. The critical stress location of Cu-filled TGV has been explored as a Cu/glass interface because the mismatching of the aforementioned material CTE, the slower ramp rate, and the decent dwell time can help manage the thermal stress [ 14 , 15 ]. To reduce Cu protrusion-induced stress, a conformal-type TGV has been demonstrated, and a fully-filled TGV with considerable copper protrusion during thermal cycling was revealed [ 16 ].…”
Section: Introductionmentioning
confidence: 99%