2018
DOI: 10.1016/j.apsusc.2017.10.132
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Investigation of anodic TiO2 nanotube composition with high spatial resolution AES and ToF SIMS

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Cited by 35 publications
(14 citation statements)
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“…EDX analysis determined 17.8 at % of C and 9.5 at % of F. EDX mapping identified that F is mainly situated on the outer wall of the nanotube while carbon is predominantly localized within the nanotube. These observations are in good agreement with the literature [47,48]. Fig.…”
Section: Morphology Structure and Composition Of Tnt Layerssupporting
confidence: 93%
See 1 more Smart Citation
“…EDX analysis determined 17.8 at % of C and 9.5 at % of F. EDX mapping identified that F is mainly situated on the outer wall of the nanotube while carbon is predominantly localized within the nanotube. These observations are in good agreement with the literature [47,48]. Fig.…”
Section: Morphology Structure and Composition Of Tnt Layerssupporting
confidence: 93%
“…The origin of DW can be explained considering the plastic flow model for the nanotube formation [45,46]. Recent papers studied the exact composition of the inner and outer shell [47,48]. The results show a high C and F contamination of the inner shell, originating from the voltage induced decomposition of the electrolyte while the outer shell consists of almost pure TiO2.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, an ultrathin fluoride-rich layer is also present at the outer walls, i.e., between individual tube walls, caused by the plastic-flow mechanism which pushes the nanotubes upward from the bottom of nanotubes/Ti interface during the tubes formation, hence promotes the F − along the tube walls (Berger et al, 2011). The fluoride-rich, double-walled morphology is well-documented with the support by EDX, XPS, High Resolution Transmission Electron Microscope (HR-TEM), High Angle Annular Dark Field Scanning TEM (HAADF-STEM) Auger Electron Spectroscopy (AES) and Time-of-Flight Secondary-ion Mass Spectrometry (ToF SIMS) depth-profiling measurements (Albu et al, 2008; Berger et al, 2011; So et al, 2017; Dronov et al, 2018).…”
Section: Resultsmentioning
confidence: 99%
“…Most likely, the decrease in etching rate (decreasing of the n eff ) after 7.5 min in H 2 O 2 is caused by layered structure of ATO pore walls. The inner layer, contacting with electrolyte during anodizing, contains more impurities from electrolyte, that makes it less stable than the deeper layer consisting mainly of titania [19]. Obtained quantitative data on thickness and the n eff of ATO will be in demand for the design of materials for antireflection coatings, memristive elements [20], photonic crystals [21], and solar cells.…”
Section: Resultsmentioning
confidence: 99%