2002
DOI: 10.1016/s0040-6090(02)00737-x
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Investigation of annealing effects on sol–gel deposited indium tin oxide thin films in different atmospheres

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Cited by 159 publications
(81 citation statements)
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“…The non-calcined and amorphous films exhibited no measurable electrical conductivity but the sheet resistance substantially decreased to about 3 × 10 5 X upon crystallization and calcination at 450°C. Moreover, the increased concentration of free charge carriers resulting from the formation of oxygen vacancies, [15,16] achieved by treating the films in a reducing atmosphere of nitrogen or hydrogen at 300-450°C, led to a decrease in the film resistance to 1 × 10 4 or 1.3 × 10 3 X, respectively, the latter corresponding to a specific resistivity of 0.02 X cm for 140-150 nm thick films. Hence, in spite of their highly developed 3D mesoporosity, the conductivity of these ITO layers was comparably high and only 1-2 orders of magnitude lower than that of compact films.…”
mentioning
confidence: 99%
“…The non-calcined and amorphous films exhibited no measurable electrical conductivity but the sheet resistance substantially decreased to about 3 × 10 5 X upon crystallization and calcination at 450°C. Moreover, the increased concentration of free charge carriers resulting from the formation of oxygen vacancies, [15,16] achieved by treating the films in a reducing atmosphere of nitrogen or hydrogen at 300-450°C, led to a decrease in the film resistance to 1 × 10 4 or 1.3 × 10 3 X, respectively, the latter corresponding to a specific resistivity of 0.02 X cm for 140-150 nm thick films. Hence, in spite of their highly developed 3D mesoporosity, the conductivity of these ITO layers was comparably high and only 1-2 orders of magnitude lower than that of compact films.…”
mentioning
confidence: 99%
“…In general, the electrical conductivity of the ITO thin films with a fixed Sn dopant concentration is determined by the oxygen vacancies and the grain size, which are responsible for the carrier density and mobility, respectively. In other reports, 3,18 a decrease in the sheet resistance with an increasing annealing temperature was attributed to the grain growth or crystallinity of ITO films. In these samples, such crystallinity enhancement was detected only for the annealed ITO layers on glass substrates, so it is thought that the conductivity increase was mainly due to the increment in the carrier concentration, especially for the ITO layers deposited onto the polyimides.…”
mentioning
confidence: 83%
“…The high optical transmittance of these two films was mainly attributed to the expansion of the gain size and the predominant gain orientation (along (400) plane), which are revealed by Table 1 and XRD patterns. From the transmittance spectra in the ultraviolet region, the ITO film absorption coefficient α can be calculated using the following equation [20]:…”
Section: Structural Properties Of Ito Thin Filmsmentioning
confidence: 99%