2009
DOI: 10.1016/j.spmi.2009.05.007
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Investigation into the effects of deposition parameters on TiO2 photocatalyst thin films by rf magnetron sputtering

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Cited by 29 publications
(20 citation statements)
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“…The optimal deposition parameters can be obtained by analyzing the experimental results of various experimental permutations using orthogonal arrays, a statistical analysis of the signal-to-noise (S/N) ratio and an analysis of variance (ANOVA) [13]. The effects of deposition parameters on TiO 2 photocatalyst thin films by rf magnetron sputtering could be analyzed using the Taguchi method (Chen et al [14]). Cheng et al identified an uniform anatase form of TiO 2 photocatalyst prepared using a modified chemical vapor deposition method under the optimal conditions, using the Taguchi method [15].…”
Section: Introductionmentioning
confidence: 99%
“…The optimal deposition parameters can be obtained by analyzing the experimental results of various experimental permutations using orthogonal arrays, a statistical analysis of the signal-to-noise (S/N) ratio and an analysis of variance (ANOVA) [13]. The effects of deposition parameters on TiO 2 photocatalyst thin films by rf magnetron sputtering could be analyzed using the Taguchi method (Chen et al [14]). Cheng et al identified an uniform anatase form of TiO 2 photocatalyst prepared using a modified chemical vapor deposition method under the optimal conditions, using the Taguchi method [15].…”
Section: Introductionmentioning
confidence: 99%
“…The RF magnetron sputtering process provides reliable and accurate thin-film deposition 13,14 . In Figure 5 is shown the deposition scheme.…”
Section: Fabricationmentioning
confidence: 99%
“…This technique required several carefully controlled steps, including heat treatment [12]. Taking into account the fact that the RMS of the initial Parylene layer was 15 nm, the thickness uniformity of the optimized ultrasound-assisted deposition of the anatase TiO 2 film (sample D) can also be compared with the titania film with a RMS of 6 nm [24]. This 6 nm roughness is produced Table 1.…”
Section: Surface Properties and Morphologymentioning
confidence: 99%
“…This 6 nm roughness is produced Table 1. on the glass substrate at 250-450°C by radio frequency magnetron sputtering method, which is based on the rather sophisticated equipment [24].…”
Section: Surface Properties and Morphologymentioning
confidence: 99%