2019
DOI: 10.1017/s1431927619010146
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Investigating Ferroelectric Domain and Domain Wall Dynamics at Atomic Resolution by TEM/STEM in situ Heating and Biasing

Abstract: Conducting domain walls (DWs) in ferroelectrics is an emerging research focus in nano-electronics [1,2]. Previously overlooked, these walls have recently been reported to possess diverse functional characteristics that are completely different from the domains that they delineate [3][4][5]. They can have their own distinct chemistry and magnetic behavior [6], and in turn represent a completely new sheet phase. The characteristics of these confined regions are believed to have the same exotic functional behavio… Show more

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“…Another drawback in implementing independent techniques to investigate ferroelectric effects on the surfaces, especially as it relates to catalysis, is establishing the identical polarization state on the surface for a reliable comparison of the results across different experiments, highlighting the importance of in situ polarization switching . Among recent efforts in addressing this issue, only cross-sectional transmission electron microscopy (TEM) and scanning TEM (STEM) with in situ biasing have been shown to be capable of providing an in-depth understanding of the surface structure and chemical shifts with atomic resolution.…”
Section: Introductionmentioning
confidence: 99%
“…Another drawback in implementing independent techniques to investigate ferroelectric effects on the surfaces, especially as it relates to catalysis, is establishing the identical polarization state on the surface for a reliable comparison of the results across different experiments, highlighting the importance of in situ polarization switching . Among recent efforts in addressing this issue, only cross-sectional transmission electron microscopy (TEM) and scanning TEM (STEM) with in situ biasing have been shown to be capable of providing an in-depth understanding of the surface structure and chemical shifts with atomic resolution.…”
Section: Introductionmentioning
confidence: 99%