2023
DOI: 10.1016/j.jallcom.2023.169020
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Investigate the heat conduction between film and substrate during sputtering process by multi-layer structure NiCr/NiSi film thermocouples

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Cited by 3 publications
(9 citation statements)
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“…The detailed discussion about EDS and XPS results could be seen in our previous reports. [ 35–37 ] Based on Figure 3e, the bulk carrier mobility ( µ ), bulk resistivity ( ρ ), bulk carrier concentration ( n ) of NiSi and NiCr films correspond well with the standard data of K type thermocouple respectively, which are measured by Hall effect system. [ 33,34 ] Then, all NiCr/NiSi TFTCs are calibrated with the accurate static calibration procedure, which has been discussed in our previous reports.…”
Section: Resultssupporting
confidence: 60%
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“…The detailed discussion about EDS and XPS results could be seen in our previous reports. [ 35–37 ] Based on Figure 3e, the bulk carrier mobility ( µ ), bulk resistivity ( ρ ), bulk carrier concentration ( n ) of NiSi and NiCr films correspond well with the standard data of K type thermocouple respectively, which are measured by Hall effect system. [ 33,34 ] Then, all NiCr/NiSi TFTCs are calibrated with the accurate static calibration procedure, which has been discussed in our previous reports.…”
Section: Resultssupporting
confidence: 60%
“…of NiCr/NiSi TFTCs is obtained, accurately. [35][36][37] Then, NiCr/NiSi TFTCs are also dynamically calibrated by the home-made system, just as shown in Figure 15. In homemade dynamic calibration system, NiCr/NiSi TFTCs were fixed and faced to Quantel ultra 50 short pulse infrared laser system.…”
Section: Methodsmentioning
confidence: 99%
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