Inverse-designed ultra-compact high efficiency and low crosstalk optical interconnect based on waveguide crossing and wavelength demultiplexer

Abstract

In this paper, we use the inverse design method to design an optical interconnection system composed of wavelength demultiplexer and the same direction waveguide crossing on silicon-on-insulator (SOI) platform. A 2.4 μm × 3.6 μm wavelength demultiplexer with an input wavelength of 1.3–1.6 μm is designed. When the target wavelength of the device is 1.4 μm, the insertion loss of the output port is − 0.93 dB, and there is − 18.4 dB crosstalk, in TE0 mode. The insertion loss of the target wavelength of 1.6 μm in TE0 mode is − 0.88 dB, and the crosstalk is − 19.1 dB. Then, we designed a same direction waveguide crossing, the footprint is only 2.4 μm × 3.6 μm, the insertion loss of the wavelength 1.4 μm and 1.6 μm in TE0 mode is − 0.99 dB and − 1 dB, and the crosstalk is − 12.14 dB and − 14.34 dB, respectively. Finally, an optical interconnect structure composed of two devices is used, which can become the most basic component of the optical interconnect network. In TE0 mode, the insertion loss of the output wavelength of 1.4 μm at the output port is − 1.3 dB, and the crosstalk is − 29.36 dB. The insertion loss of the output wavelength of 1.6 μm is − 1.39 dB, and the crosstalk is − 38.99 dB.

Supplementary document for Topological inverse design of fabrication-constrained nanophotonic devices via adaptive projection method - 6063130.pdf

“…Yu et al inversely designed a waveguide crossing with good performance, but the footprint of 28.27 μm 2 was still unsatisfactory [3]. Xu et al reduced the footprint of waveguide crossing to less than 10 μm 2 using inverse design, however high insertion loss is unacceptable [4]. In comparison, the waveguide crossing designed inversely using our proposed adaptive projection method not only possesses footprint as small as 8.87 μm 2 , but also holds an ultra-low insertion loss of only 0.075 dB at 1310 nm, which is the best performance for waveguide crossing below 10 μm 2 within our knowledge.…”

A new amber outcrop from the Oligocene Nanning Basin of Guangxi, southern China

“…specified footprints or structures) without manually tedious parameter adjustment works, saving massive resources. There are many reports on developments or improvements of nano-photonic devices using inverse design with various optimization algorithms [47][48][49][50][51][52][53][54][55][56][57][58][59][60], but only few studies about the applications of inverse design on nonreciprocal devices [61][62][63][64], which are normally based on magneto-optical effects. In this study, we introduce several magnetic-free nonreciprocal devices that avoid use of magneto-optical materials and magnets, which are difficult to be compatible with current semiconductor integration technology.…”

Optical coupling into deeply etched Si waveguide

“…Deeply etched Si waveguides are currently required in Si photonic integrated optical circuits for many applications. They are required in optical interconnections to reduce the divergence of the optical beams outside the waveguide [1]. They are also useful in reducing the optical intensity in the waveguides for the same optical power which is very important in many applications to avoid the non-linear effects like the 2 photons absorption in the Si ring resonators where the intensity stored inside the resonator is much higher than the input optical intensity [2].…”