Analysis and Simulation of Semiconductor Devices 1984
DOI: 10.1007/978-3-7091-8752-4_1
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Cited by 7 publications
(3 citation statements)
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“…A drift-diffusion model is used to simulate the metal–semiconductor junction for each core–shell nanoparticle design through the Automat FOR Simulation of HETerostructures (AFORS-HET) software v.2.5. This numerical simulation software uses a 1D drift-diffusion model based on self-consistent solutions to the Poisson equation to model the band bending, carrier tunneling, and junction properties . See Supporting Information for input parameters and the built-in field calculation.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…A drift-diffusion model is used to simulate the metal–semiconductor junction for each core–shell nanoparticle design through the Automat FOR Simulation of HETerostructures (AFORS-HET) software v.2.5. This numerical simulation software uses a 1D drift-diffusion model based on self-consistent solutions to the Poisson equation to model the band bending, carrier tunneling, and junction properties . See Supporting Information for input parameters and the built-in field calculation.…”
Section: Methodsmentioning
confidence: 99%
“…This numerical simulation software uses a 1D drift-diffusion model based on self-consistent solutions to the Poisson equation to model the band bending, carrier tunneling, and junction properties. 55 See Supporting Information for input parameters and the built-in field calculation.…”
Section: Methodsmentioning
confidence: 99%
“…To enhance the analysis of the SPV measurements by KPFM under illumination, we conducted band structure simulations using a one-dimensional drift-diffusion model . This model incorporates factors such as Shockley–Read–Hall (SRH), radiative and Auger recombinations, laser excitation, and polarization charges.…”
Section: Experimental Methodsmentioning
confidence: 99%