Abstract:The usage of phasefluid based stripping agents to remove photoresists from silicon substrates was studied. Due to their highly dynamic inner structure phasefluids offer a new working principle, they are penetrating layers through smallest openings and lift off the material from the surface. These non-aggressive stripping fluids were investigated regarding their cleaning efficiency as well as contamination behavior to enable usage in semiconductor and MEMS manufacturing. A general proof of concept for the usage… Show more
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