Introduction

Asmussen, J.; Reinhard, D.K.

doi:10.1201/9780203910603.ch1

Cited by 28 publications

(47 citation statements)

References 7 publications

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“…The main advantage of this technique is the generation of high concentration of the reactive species (radicals, atoms) that can form a coating with high deposition rates due to steep gradients in the boundary layer plasma -substrate. It has been obtained that the growth rate of hydrogenated amorphous carbon films (a-C:H) or polycrystalline diamonds produced by arc plasma jet technique can reach up to 100 nm/s [4][5][6][7]. Meanwhile, the growth rates of a-C:H obtained by traditional chemical vapour deposition (CVD) or physical vapour deposition (PVD) techniques are ten or hundred times lower compared to the arc plasma jet [8][9][10][11][12].…”

Section: Introductionmentioning

confidence: 99%

“…Nowadays thermal plasmas are widely used for the production of ultrafine particles, formation of various coatings (ceramic, metal oxide, carbon), surface modification, or waste treatment [1][2][3][4]. The main advantage of this technique is the generation of high concentration of the reactive species (radicals, atoms) that can form a coating with high deposition rates due to steep gradients in the boundary layer plasma -substrate.…”

Section: Introductionmentioning

confidence: 99%

“…Many authors [4][5][6][7][8][9][10][11][12] have demonstrated that the hydrogen concentration and corresponding proportion of the sp 2 and sp 3 carbon sites in the films determines the properties of carbon coatings. Variation of the deposition process parameters allows one to control and produce a-C:H films with desirable properties.…”

Section: Introductionmentioning

confidence: 99%

“…Variation of the deposition process parameters allows one to control and produce a-C:H films with desirable properties. It has been demonstrated that the type of hydrocarbon gases and its amount in plasma, the power of the torch, the pressure, the substrate temperature, and the plasma torch construction are very important factors during the deposition of films by plasma jet CVD [4][5][6][7].…”

Section: Introductionmentioning

confidence: 99%

“…The second advantage of this technique is the formation of carbon films at the atmospheric pressure conditions. However, despite these advantages, the deposition of a-C:H coatings is a complicated process and depends on many different factors [4][5][6][7].…”

Section: Introductionmentioning

confidence: 99%

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Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Marcinauskas¹,

Grigonis²,

Valincius³

et al. 2009

Lithuanian J. Phys.

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The amorphous hydrogenated carbon films (a-C:H) were formed on the stainless steel substrates from an argon-acetylene gas mixture at atmospheric pressure using a direct current plasma torch discharge. The carbon films were deposited using Ar/C2H2 gas volume ratios 100:1, 150:1, and 200:1 and plasma torch power of 600 and 870 W. It has been obtained that the increase of the torch power leads to higher film growth rate and increases surface roughness. The growth rate varies from 20 up to 425 nm/s depending on the coating formation conditions. The structure and dominant bonds of the films were investigated by Fourier transform infrared (FTIR) and Raman spectroscopy (RS) measurements. RS results indicated that the sp 2 /sp 3 content in the films depended on the torch power and C2H2 amount in argon plasma. It was demonstrated that a diamond-like / graphite-like carbon and glassy carbon films could be deposited by varying the Ar/C2H2 ratio and plasma torch power.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Marcinauskas¹,

Grigonis²,

Valincius³

et al. 2009

Lithuanian J. Phys.

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Sample Environment

Melnichenko¹

2016

Small-Angle Scattering From Confined and Interfacial Fluids

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Sample environment is the collective name given to the pieces of equipment that hold or contain the sample and allow the variation of external parameters, such as pressure, temperature, magnetic field, shear rate, etc. This chapter considers different types of sample cells and containers used for the structural studies of porous materials at ambient conditions as well as for investigation of the fluid adsorption in pores at ambient and elevated pressure and temperature. Particular attention is given to description of the design and operation principles of high-pressure cells used for the SAS studies of the confined supercritical fluids and gases under pressure using different types of radiation (neutrons and x-rays).

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Optical and structural properties of polycrystalline CVD diamond films grown on fused silica optical fibres pre-treated by high-power sonication seeding

et al. 2014

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In this paper, the growth of polycrystalline chemical vapour deposition (CVD) diamond thin films on fused silica optical fibres has been investigated. The research results show that the effective substrate seeding process can lower defect nucleation, and it simultaneously increases surface encapsulation. However, the growth process on glass requires high seeding density. The effects of suspension type and ultrasonic power were the specific objects of investigation. In order to increase the diamond density, glass substrates were seeded using a high-power sonication process. The highest applied power of sonotrode reached 72 W during the performed experiments. The two, most common diamond seeding suspensions were used, i.e. detonation nanodiamond dispersed in (a) dimethyl sulfoxide and (b) deionised water. The CVD diamond nucleation and growth processes were performed using microwave plasma assisted chemical vapour deposition system. Next, the seeding efficiency was determined and compared using the numerical analysis of scanning electron microscopy images. The molecular composition of nucleated diamond was examined with micro-Raman spectroscopy. The sp 3 / sp 2 band ratio was calculated using Raman spectra deconvolution method. Thickness, roughness, and optical properties of the nanodiamond films in UV-vis wavelength range were investigated by means of spectroscopic ellipsometry. It has been demonstrated that the high-power sonication process can improve the seeding efficiency on glass substrates. However, it can also cause significant erosion defects at the fibre surface. We believe that the proposed growth method can be effectively applied to manufacture the novel optical fibre sensors. Due to high chemical and mechanical resistance of CVD diamond films, deposition of such films on the sensors is highly desirable. This method enables omitting the deposition of an additional adhesion interlayer at the glass-nanocrystalline interface, and thus potentially increases transmittance of the optical system.

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Introduction

Cited by 28 publications

References 7 publications

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Sample Environment

Optical and structural properties of polycrystalline CVD diamond films grown on fused silica optical fibres pre-treated by high-power sonication seeding

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Introduction

Cited by 28 publications

References 7 publications

Influence of torch power and Ar/C2H2ratio on structure of amorphous carbon films

Influence of torch power and Ar/C2H2ratio on structure of amorphous carbon films

Sample Environment

Optical and structural properties of polycrystalline CVD diamond films grown on fused silica optical fibres pre-treated by high-power sonication seeding

Contact Info

Product

Resources

About

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films