Introduction

New Directions in Inorganic and Metal-Organic Coordination Chemistry in Supercritical Fluids

“…The production of thin films of metals (and metal oxides) is an area of significant scientific and technological importance because the wealth of potential applications including the production of microelectronic devices, luminous displays, or glasses with special optical properties . One of the best known and simplest methods for thin film manufacture, MOCVD, involves the sublimation of a volatile metal complex (usually a metal−organic complex or metal halide), which is transported onto a substrate (often heated to induce decomposition). ,,, The compound is then adsorbed onto the substrate where the supporting ligands are lost. The metal atoms formed on the substrate surface, then diffuse and agglomerate to form “seeds ” for the growth of metallic/metal oxide films.…”

Synthesis, Characterization, and Single-Crystal X-ray Structures of Refractory Metal Compounds as Precursors for the Single-Source Chemical Vapor Deposition of Metal Nitrides

“…A reliable method for preparing thin films of refractory metals and their nitrides is chemical vapor deposition (CVD). − Films deposited using CVD are isotropic and highly conformal compared to films formed from physical deposition processes, which are limited to line-of-sight deposition. CVD relies on gas–solid reactions between a gaseous, chemical precursor and a solid substrate. − While precursors are designed to be highly volatile, thermal stability is a more complicated consideration.…”

Collision-induced activation of the β-hydride elimination reaction of isobutyl iodide dissociatively chemisorbed on Al(111)

“…This deficit is significant given that the growth-rate hysteresis and morphology are strongly determined by these early events and thus of central importance in determining the lifetimes ͑which are sensitive to microstructure͒ of devices so constructed. 5,32 A goal of the research reported here is to develop a better understanding of the mechanisms and energetics involved in the reaction-limited nucleation of Al-CVD ͑and other͒ thin films. In this report, we examine the feasibility of using hyperthermal, inert gas atom beams to activate large surface-bound organometallic fragments, such as those that might be found in Al-CVD processes involving TIBA.…”

“…The ability to activate reactions in complex adsorbates would be of great utility in exploring activated chemisorption phenomena such as those involved in the technologically important areas of catalysis 3,8 and materials growth and processing. 4,5,8,[30][31][32] The present study explores the feasibility of using collision-induced processes to understand the dynamics and energetics of reactions involved in the chemical vapor deposition ͑CVD͒ of aluminum.…”