2008
DOI: 10.1103/physrevb.77.075312
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Intersubband carrier scattering inn- andpSiSiGequantum wells with diffuse interfaces

Abstract: Scattering rate calculations in two-dimensional Si/Si1−xGex systems have typically been restricted to rectangular Ge profiles at interfaces between layers. Real interfaces however, may exhibit diffuse Ge profiles either by design or as a limitation of the growth process. It is shown here that alloy disorder scattering dramatically increases with Ge interdiffusion in (100) and (111) n-type quantum wells, but remains almost constant in (100) p-type heterostructures. It is also shown that smoothing of the confini… Show more

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Cited by 22 publications
(37 citation statements)
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“…We used a semiclassical time-independent perturbation theoretical approach, including interface roughness (IR), alloy disorder (AD), deformation potential electron-phonon interactions (EP), acoustic phonon (AC) and ionised impurity (II) interactions. [11] For all our calculations, we set the lattice temperature to 4 K. The carrier temperature was set to 24 K which yields scattering rates in good agreement with pumpprobe spectroscopy measurements on double well systems. [17] As modulation doping of SiGe-based heterostructures may be poor, [9] doping was spread evenly throughout each system at a concentration of 10 16 cm −3 .…”
Section: Transport Modelmentioning
confidence: 96%
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“…We used a semiclassical time-independent perturbation theoretical approach, including interface roughness (IR), alloy disorder (AD), deformation potential electron-phonon interactions (EP), acoustic phonon (AC) and ionised impurity (II) interactions. [11] For all our calculations, we set the lattice temperature to 4 K. The carrier temperature was set to 24 K which yields scattering rates in good agreement with pumpprobe spectroscopy measurements on double well systems. [17] As modulation doping of SiGe-based heterostructures may be poor, [9] doping was spread evenly throughout each system at a concentration of 10 16 cm −3 .…”
Section: Transport Modelmentioning
confidence: 96%
“…[8] In reality however, diffuse Ge profiles may result from processes such as surface segregation during growth, [9] or by annealing. [10] Having established that this leads to significant changes in the subband spacing and scattering rates in QWs, [11] we now turn to the specific issue of barrier degradation in QC lasers.…”
Section: Introductionmentioning
confidence: 99%
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“…Both processes change the electronic behaviour of a system by narrowing the QWs and degrading the barriers of QWs. In such interdiffused or inter-mixed QW structures with smooth interface profiles, significant changes in the sub-band spacing and carrier scattering rates in a Si/SiGe QW system [6], were predicted.…”
Section: Introductionmentioning
confidence: 99%
“…Their most spectacular applications are quantum well IR photodetectors [3] and the quantum cascade (QC) lasers [4], that relies on the cascaded intersub-band transitions and resonant tunneling between adjacent QWs. These devices are made with epitaxially grown GaAs/AlGaAs, InGaAs/AlInAs, GaN/AlGaN [1,5]], and Si/SiGe [6] systems. With the recent development on semiconductor device growth technology, multi-barrier quantum well structures are becoming the basic building blocks of modern semiconductor devices, such as resonant tunneling diodes (RTD) [7], high-speed light modulators [8,9], wavelength tunable lasers [10,11], far-infrared and THz lasers [12], quantum cascade (QC) lasers [4,13], etc.…”
Section: Introductionmentioning
confidence: 99%