2023
DOI: 10.1021/acsaem.3c02075
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Interplay between Growth Mechanism, Materials Chemistry, and Band Gap Characteristics in Sputtered Thin Films of Chalcogenide Perovskite BaZrS3

Soham Mukherjee,
Stefania Riva,
Corrado Comparotto
et al.

Abstract: The prototypical chalcogenide perovskite BaZrS3, characterized by its direct band gap, exceptionally strong light-harvesting ability, and good carrier transport properties, provides fundamental prerequisites for a promising photovoltaic material. This inspired the synthesis of BaZrS3 in the form of thin films, using sputtering and rapid thermal processing, aimed at device fabrication for future optoelectronic applications. Using a combination of short- and long-range structural information from X-ray absorptio… Show more

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Cited by 8 publications
(13 citation statements)
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“…In both cases the data were fitted with three peaks at 530.80 eV, 532.11 eV and 533.41 eV, respectively assigned to Zr bound to O, BaSO4 and chemisorbed O, with the proportion of the different O species being different between the powder and the thin film. Similar results were obtained in the paper by Mukherjee et al 18 , where the varying ratios of the chemical species obtained at different annealing temperatures could be attributed to the varied surface oxidation effects.…”
Section: Core Level Photoelectron Spectroscopysupporting
confidence: 90%
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“…In both cases the data were fitted with three peaks at 530.80 eV, 532.11 eV and 533.41 eV, respectively assigned to Zr bound to O, BaSO4 and chemisorbed O, with the proportion of the different O species being different between the powder and the thin film. Similar results were obtained in the paper by Mukherjee et al 18 , where the varying ratios of the chemical species obtained at different annealing temperatures could be attributed to the varied surface oxidation effects.…”
Section: Core Level Photoelectron Spectroscopysupporting
confidence: 90%
“…The thin film was prepared on a silicon substrate via sputtering from BaS and Zr target in an atmosphere of H2S and Ar, with a consequent annealing process at 900 °C, as described in our previous report 7 . The sample was defined as the best of a temperature annealing series in terms photoluminescence peak, XRD analysis, XAS and XPS characterization 7,18 .…”
Section: Synthesis Of Thin Film and Characterizationmentioning
confidence: 99%
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