2021
DOI: 10.1016/j.triboint.2021.107004
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Interplay between counter-surface chemistry and mechanical activation in mechanochemical removal of N-faced GaN surface in humid ambient

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Cited by 53 publications
(9 citation statements)
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“…Leishmaniasis is one of the most important infectious diseases in the world with 30,000 deaths annually 54 , which leads to the death by damaging macrophage cells, spleen, bone marrow, and liver. With the advancement of technology and the inadequacy of current therapeutic drugs, the application of nanostructures with unique properties and plant extracts with antimicrobial activities has recently attracted the attention of researchers 55 . Today, various nanostructures with different structures, suitable permeability, targeting properties, low toxicity, lack of resistance, high stability, and cost-effectiveness properties are widely deployed in the treatment of different diseases 54 , 56 .…”
Section: Discussionmentioning
confidence: 99%
“…Leishmaniasis is one of the most important infectious diseases in the world with 30,000 deaths annually 54 , which leads to the death by damaging macrophage cells, spleen, bone marrow, and liver. With the advancement of technology and the inadequacy of current therapeutic drugs, the application of nanostructures with unique properties and plant extracts with antimicrobial activities has recently attracted the attention of researchers 55 . Today, various nanostructures with different structures, suitable permeability, targeting properties, low toxicity, lack of resistance, high stability, and cost-effectiveness properties are widely deployed in the treatment of different diseases 54 , 56 .…”
Section: Discussionmentioning
confidence: 99%
“…The results suggested that the mechanochemical activation effect is larger for Si (100) and Si (111) than Si (110) which is chemically more reactive than the other two surfaces. CMP of precorroded Lu 2 O 3 laser crystals [347], CaF 2 crystal [348], SiC substrate [349], and N-faced GaN surface [350] were researched experimentally. A new kind of electrical enhanced photocatalysis polishing slurry was developed and tested for polishing monocrystalline silicon carbide wafer [351].…”
Section: Wear In Metalworking and Polishing Processesmentioning
confidence: 99%
“…Although the absolute value of E a cannot be obtained without determining A, this expression physically represents the self-driven force of the mechanochemical reactions that occurs at the tribological interface when the external mechanical interaction is negligible. Based on the computational results regarding the physical meaning of the V * , the value is described as the minimum amount of change in molecular volume to initiate chemical reactions of that specific molecule by shear and compressive stress, reflecting the degree of the required shear-induced structural deformation to rupture Ga-N or Ga-O-N bond via mechanochemical reactions (Yeon et al, 2017;Guo et al, 2021b). The above results demonstrate that less external mechanical activation is required to initiate the mechanochemical atomic attrition for oxidized GaN surface compared with the pristine GaN surface without oxide layer.…”
Section: Influencing Mechanism Of Oxide Layer On the Mechanochemical Removal Of Gan Surfacementioning
confidence: 99%