1982
DOI: 10.6028/nbs.sp.400-74
|View full text |Cite
|
Sign up to set email alerts
|

Interlaboratory study on linewidth measurements for antireflective chromium photomasks

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
9
0

Year Published

1982
1982
1992
1992

Publication Types

Select...
4
2

Relationship

2
4

Authors

Journals

citations
Cited by 6 publications
(9 citation statements)
references
References 0 publications
0
9
0
Order By: Relevance
“…The study also demonstrated that the same system when properly calibrated using a linewidth artifact would produce linewidth measurements with negligible systematic errors (Jerke et al [23]).…”
Section: Models For a Measurement Systemmentioning
confidence: 89%
“…The study also demonstrated that the same system when properly calibrated using a linewidth artifact would produce linewidth measurements with negligible systematic errors (Jerke et al [23]).…”
Section: Models For a Measurement Systemmentioning
confidence: 89%
“…These and other topics are discussed more fully in the references [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. The need to use good measurement techniques to achieve the best results with these linewidth standards cannot be overemphasized.…”
Section: Bmentioning
confidence: 99%
“…These and other topics are discussed more fully in the references [1,14]. The need to use good measurement techniques to achieve the best results with these linewidth standards cannot be overemphasized.…”
Section: Special Precautionsmentioning
confidence: 99%