III−V semiconductor light-emitting diodes (LEDs) on Si substrates, suitable for large-scale and large-wafer-size manufacturing, are a convenient option for on-chip light sources. Here, we present the design and fabrication of a MoS 2 nanosheetdecorated InGaN/AlGaN/GaN LED on a Si substrate with a Fabry−Perot waveguide, utilizing standard microfabrication processes. We assess the voltage−current characteristics, electroluminescence (EL) properties, polarization properties, chrominance, and surface temperature of the device. The MoS 2 layer's spectrum filtering effect and the waveguide's interference effect influence the EL properties of GaN LED. The MoS 2 -decorated LED device presented different properties than the bare LED in terms of a higher turn-on voltage, uniform emission pattern, lower surface temperature, and higher polarizability. Besides, the underlying mechanism for spectral modulation is studied. The MoS 2decorated device demonstrates an EL peak near 417 nm, with a high side mode suppression ratio and full width at half-maximum (FWHM) < 1 nm. Our study offers insights into the potential realization of light sources with narrowed spectra using GaN LEDs based on Si materials.