Abstract:Artificially
programming a sequence of organic–metal oxide
multilayers (superlattices) by using atomic layer deposition (ALD)
is a fascinating and challenging issue in material chemistry. However,
the complex chemical reactions between ALD precursors and organic
layer surfaces have limited their applications for various material
combinations. Here, we demonstrate the impact of interfacial molecular
compatibility on the formation of organic–metal oxide superlattices
using ALD. The effects of both organic and in… Show more
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