Abstract:Programming artificially a sequence of organic-metal oxide multilayers (superlattices) by using atomic layered depositions (ALD) is a fascinating and challenging issue in material chemistry. However, the complex chemical reactions between ALD precursors and organic layer surfaces have limited their applications for various material combinations. Here we demonstrate the impact of interfacial molecular compatibility on the formation of organic-metal oxide superlattices using ALD. The effects of both organic and … Show more
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