2002
DOI: 10.1063/1.1522475
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Interfacial and microstructural properties of SrTiO3 thin films grown on Si(001) substrates

Abstract: The microstructure and interfaces of SrTiO 3 thin films directly deposited by metalorganic chemical vapor deposition on silicon ͑001͒ substrates were investigated by means of Bragg-diffraction contrast and high-resolution transmission electron microscopy. The observation of the plan-view specimens showed that the SrTiO 3 films are polycrystalline with randomly oriented grains. An amorphous layer was observed at the interfaces between the films and the substrates. The growth kinetics of this amorphous layer was… Show more

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Cited by 28 publications
(23 citation statements)
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“…This saturation behavior, which was also observed in the deposition of HfO 2 with a Hf(NO 3 ) 4 precursor [15] and the deposition of SrTiO 3 on Si(1 0 0) [24], indicates that the interfacial growth is finally controlled by a diffusion-limited mechanism.…”
Section: Article In Presssupporting
confidence: 53%
“…This saturation behavior, which was also observed in the deposition of HfO 2 with a Hf(NO 3 ) 4 precursor [15] and the deposition of SrTiO 3 on Si(1 0 0) [24], indicates that the interfacial growth is finally controlled by a diffusion-limited mechanism.…”
Section: Article In Presssupporting
confidence: 53%
“…For instance, an amorphous layer is often observed between the substrate and the film when PLD is used to deposit metal-oxide on Si. 20,21 It should be noted that the chemical information from different regions (see Fig. 1(b)) has also been mapped by EDS, where the sample was prepared by a focused ion beam technique.…”
mentioning
confidence: 99%
“…The change in the oxidation state of Ti ions in SrTiO 3 single crystals by an applied electric field ͑a few tens of kV/cm͒ at elevated temperatures ͑ϳ500°C͒ has been reported by He et al 18 It seems that the excessively high electric field in the thin-film experiments made the oxygen ions move even at room temperature.…”
Section: -3mentioning
confidence: 81%