Interfaces in Atomic Layer Deposited Films: Opportunities and Challenges
Syed Jazib Abbas Zaidi,
Jae Chan Park,
Ji Won Han
et al.
Abstract:Atomic layer deposition (ALD) is an effective method for precise layer‐wise growth of thin‐film materials and has allowed for substantial progress in a variety of fields. Advances in the technique have instigated high‐level interpretations of the relationship between nanostructure architecture and performance. An inherent part in the ALD of films is the underlying interfaces between each material, which plays a significant role in advanced electronics. Considering the impact of sandwiched substructures, it is … Show more
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