2016
DOI: 10.1021/acsami.6b01568
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Interface Properties of Atomic-Layer-Deposited Al2O3 Thin Films on Ultraviolet/Ozone-Treated Multilayer MoS2 Crystals

Abstract: We report the interface properties of atomic-layer-deposited Al2O3 thin films on ultraviolet/ozone (UV/O3)-treated multilayer MoS2 crystals. The formation of S-O bonds on MoS2 after low-power UV/O3 treatment increased the surface energy, allowing the subsequent deposition of uniform Al2O3 thin films. The capacitance-voltage measurement of Au-Al2O3-MoS2 metal oxide semiconductor capacitors indicated n-type MoS2 with an electron density of ∼10(17) cm(-3) and a minimum interface trap density of ∼10(11) cm(-2) eV(… Show more

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Cited by 80 publications
(74 citation statements)
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“…Secondly, high energy photons could also influence the oxidization state and crystalline situation in the oxides . Therefore the chemical and microstructural properties of the objects have been further investigated, as shown in Figure .…”
Section: Resultsmentioning
confidence: 99%
“…Secondly, high energy photons could also influence the oxidization state and crystalline situation in the oxides . Therefore the chemical and microstructural properties of the objects have been further investigated, as shown in Figure .…”
Section: Resultsmentioning
confidence: 99%
“…Here, the recent demonstration of a natural thin‐body MoS 2 FET with an effective channel length of ≈ 3.9 nm has facilitated research on 2D layered channels due to overcoming the scaling limit of ≈ 5 nm for Si gate length . Although the dangling‐bond‐free surface of the layered channel is expected to ideally provide an electrically inert interface, there are many reports on the wide range of interface state densities ( D it ) from 10 11 to 10 13 eV −1 cm −2 for high‐ k top‐gate n ‐MoS 2 FET in reality, which must be reduced to improve the device performance. To date, several physical origins for D it have been proposed, which are summarized in Figure a.…”
Section: Introductionmentioning
confidence: 99%
“…[41,42] Therefore, the Al 2 O 3 clusters bind the intrinsic defects, including the V S in the MoS 2 monolayer. Different coverages of Al 2 O 3 are directly deposited on the top of the MoS 2 device at 373 K, using trimethyl aluminum (TMA) and H 2 O precursors.…”
Section: Wwwadvelectronicmatdementioning
confidence: 99%