2012
DOI: 10.1016/j.jnoncrysol.2012.01.048
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Interface properties of amorphous-crystalline silicon heterojunctions prepared using DC saddle-field PECVD

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Cited by 5 publications
(6 citation statements)
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(17 reference statements)
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“…rent pulsed (DC-pulsed) plasma-enhanced chemical vapor deposition (PECVD) is one of the most promising methods for surface modification of tool steels used in various industries. [8][9][10] This technique enables the uniform coating of complex-shaped parts like forming tools or the die casting components because of the higher operating pressure as compared to PVD, and due to plasma activation of the gas phase, lowers the deposition temperature significantly as compared to conventional thermal CVD. Other studies also indicated that the DLC films problem in sustaining stable plasma conditions during the deposition of insulating films could be solved by using bipolar-pulsed plasma sources.…”
Section: Deposition Of Dlc/oxynitriding Films Onto Jis Skd11 Steel Bymentioning
confidence: 99%
“…rent pulsed (DC-pulsed) plasma-enhanced chemical vapor deposition (PECVD) is one of the most promising methods for surface modification of tool steels used in various industries. [8][9][10] This technique enables the uniform coating of complex-shaped parts like forming tools or the die casting components because of the higher operating pressure as compared to PVD, and due to plasma activation of the gas phase, lowers the deposition temperature significantly as compared to conventional thermal CVD. Other studies also indicated that the DLC films problem in sustaining stable plasma conditions during the deposition of insulating films could be solved by using bipolar-pulsed plasma sources.…”
Section: Deposition Of Dlc/oxynitriding Films Onto Jis Skd11 Steel Bymentioning
confidence: 99%
“…Measurements of the lateral conductance have been performed both on (n) a‐Si:H/(p) c‐Si structures, and on (p) a‐Si:H/(n) c‐Si structures, using the schematic principle given in Figure .…”
Section: Determination Of Band Diagrams At Silicon Heterojunctionsmentioning
confidence: 99%
“…1, both the amplitude and the phase of the PCR signal were measured as a function of modulation frequency and then fitted to the foregoing theoretical model, Eq. (9). In view of the fact that several (7) unknown parameters had to be extracted from only two PCR signal channels (amplitude and phase), albeit over the entire frequency range (a substantial constraint), and in the absence of a rigorous mathematical proof of uniqueness of fit and measurement, in the multi-parameter fitting procedure we used two independent best-fitting computational programs to investigate the reliability and thus the uniqueness of the bestfitted results in a statistical analysis.…”
Section: Theorymentioning
confidence: 99%
“…Thin amorphous silicon films were deposited on silicon substrates using DC saddle field plasma enhanced chemical vapor deposition (DCSF-PECVD). 9 The thicknesses of i-a-Si and p-a-Si were all 30 nm and the thickness of the 1 Ω cm CZ n-c-Si substrate wafer was 290 µm for all samples in Table I.…”
Section: Instrumentation and Materialsmentioning
confidence: 99%
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