2007
DOI: 10.1002/pssc.200777349
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Interdiffusion effect on exchange coupling in annealing NiFe/FeMn and FeMn/NiFe systems

Abstract: The effect of interdiffusion on the exchange coupling field (H ex ) and coercivity (H c ) in annealing NiFe/FeMn and FeMn/NiFe systems was investigated in the study. Type I samples: Silicon substrate/Ta/NiFe/FeMn/Ta and Type II samples: Silicon substrate/Ta/FeMn/NiFe/Ta were prepared. Annealing was carried out at 200 to 450 °C for two hours under 720 Oe, respectively. The results show that the Hex and Hc in two types samples were dependent on the annealing temperature. For both types the magnetization loss rat… Show more

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Cited by 4 publications
(3 citation statements)
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“…The surface/interface R rms increases with the temperature rising after the spin valve has been heated. This is consistent with the conclusion obtained by Chen et al, [17] in which the roughness of NiFe/FeMn bilayer increases with the temperature rising. Figure 3 shows that the shape of the hysteresis loop of the CoFe/Cu/CoFe/IrMn spin valve changes greatly with the increase of temperature.…”
Section: Resultssupporting
confidence: 93%
See 1 more Smart Citation
“…The surface/interface R rms increases with the temperature rising after the spin valve has been heated. This is consistent with the conclusion obtained by Chen et al, [17] in which the roughness of NiFe/FeMn bilayer increases with the temperature rising. Figure 3 shows that the shape of the hysteresis loop of the CoFe/Cu/CoFe/IrMn spin valve changes greatly with the increase of temperature.…”
Section: Resultssupporting
confidence: 93%
“…Roughness is also an important factor that affects exchange bias. [17][18][19] Generally, the exchange bias field decreases upon increasing the roughness; [20,21] therefore, the increased surface/interface roughness after heating at 150 • C and 275 • C is another major reason for the reduction in the multilayer exchange bias field of the spin valves.…”
Section: Resultsmentioning
confidence: 99%
“…Notably, the permalloy layer should be deposited on manganese or the manganese containing alloy [1]. With this deposition order, the authors of [2] fixed the high value H ex = 110 Oe after the annealing of the FeMn(15nm)/NiFe(15nm) bilayers. It should be noted that the formation of this ordered system is only possible with the thermal treatment of the films that contain the permalloy and manganese layers or the layers of the manganese containing alloy.…”
Section: Introductionmentioning
confidence: 99%