Interaction of Neutral Atoms with a Solid Surface

Arifov, U.A.

doi:10.1007/978-1-4899-4809-0_9

Cited by 6 publications

(11 citation statements)

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“…On the other hand, the sputtering rate and the secondary electron current can be detected only when the beam energy is higher than the threshold voltage of the sputtering and the secondary electron emission, respectively [2,61]. In the secondary electron method, the secondary electron yield depends strongly on the surface composition and morphology of the target.…”

Section: Conventional Methods For Beam Characteristics Measurementmentioning

confidence: 99%

“…It can also be used for the analysis of not only semiconductors and metals but also insulators, composites and inorganic and organic materials. Interactions of neutral atoms with solid surfaces are classified by their beam energy, as shown in figure 1 [2,3].…”

Section: Interaction Of Neutral Atoms With a Solid Surface And Its Ap...mentioning

confidence: 99%

“…The first unique characteristic of the FAB process is that insulating materials can be etched, in spite of charge buildup with a threshold voltage of approximately 500 eV due to secondary electron emission [2]. Incident neutral atoms and molecules are not distorted or repelled by an electric field.…”

Section: Interaction Of Neutral Atoms With a Solid Surface And Its Ap...mentioning

confidence: 99%

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Characterization of neutral beam source using dc cold cathode discharge and its application processes

Ichiki

Hatakeyama

2008

J. Phys. D: Appl. Phys.

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Fast atom beam (FAB) sources using dc cold cathode discharge, comprising parallel plate electrodes and thick carbon plate cathodes with multiple beam extracting apertures, were developed to generate parallel and straight energetic neutral beams for precise etching of three-dimensional microstructures consisting of insulating materials. Conventional FAB sources and their applications are briefly reviewed, and the advantages of newly developed FAB sources and new applications are introduced. By using SF6 gas, a precise etching of quartz glass with an etch rate of 30 nm min−1, a uniformity of within 4% (P–V) in Ø76 mm, vertical etch profile, smooth etch surface and long-term etch rate stability over 250 min were realized. The neutralization coefficient and the beam current density were also measured using a secondary electron method and a pulse-counting method, making it possible to measure the neutralization coefficient without referring to databases for secondary electron yields. A neutralization coefficient of 98% was obtained at maximum, although, under practical etching conditions, the neutralization coefficient is less than 70%. By comparing the results of the simple model calculation with the experimental data, it was determined that the neutralization mechanism was dominated by charge transfer. The importance of neutralization in a process chamber is also discussed.

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Section: Conventional Methods For Beam Characteristics Measurementmentioning

confidence: 99%

Section: Interaction Of Neutral Atoms With a Solid Surface And Its Ap...mentioning

confidence: 99%

Section: Interaction Of Neutral Atoms With a Solid Surface And Its Ap...mentioning

confidence: 99%

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Characterization of neutral beam source using dc cold cathode discharge and its application processes

Ichiki

Hatakeyama

2008

J. Phys. D: Appl. Phys.

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“…Besides the results of Hagstrum, Baragiola et al relied on the results of Oechsner [48] and Arifov. [49] The former, however, used Ar + ions with a kinetic energy of 1 keV, which can significantly increase the electron yield compared with relatively slow ions (4-100 eV). Since our model does not consider kinetic mechanisms in the calculation of the yield, this could be an explanation as to why our results lie below Baragiola's fit.…”

Section: (B) (A)mentioning

confidence: 99%

Plasmonic effects in the neutralization of slow ions at a metallic surface

Bercx,

Mayda,

Depla

et al. 2023

Contributions to Plasma Physics

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Secondary electron emission is an important process that plays a significant role in several plasma‐related applications. As measuring the secondary electron yield experimentally is very challenging, quantitative modelling of this process to obtain reliable yield data is critical as input for higher‐scale simulations. Here, we build upon our previous work combining density functional theory calculations with a model originally developed by Hagstrum to extend its application to metallic surfaces. As plasmonic effects play a much more important role in the secondary electron emission mechanism for metals, we introduce an approach based on Poisson point processes to include both surface and bulk plasmon excitations to the process. The resulting model is able to reproduce the yield spectra of several available experimental results quite well but requires the introduction of global fitting parameters, which describe the strength of the plasmon interactions. Finally, we use an in‐house developed workflow to calculate the electron yield for a list of elemental surfaces spanning the periodic table to produce an extensive data set for the community and compare our results with more simplified approaches from the literature.

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“…Such treatment of the electron emission problem is not correct because, if the measurements have been performed in a differential manner, the presence of such particles is manifested by some structure in the energy and angular distributions (Soszka and Soszka 1983). The surface adsorbed layer essentially determines the features of the ion-electron emission under 'classical vacuum conditions' (Arifov 1969). Under ultrahigh-vacuum conditions the influence of adsorbed particles can indeed be neglected but the role of impurities deposited by the ion beam is still important.…”

Section: Introductionmentioning

confidence: 99%

Ion-electron emission from a cold metal target covered by xenon

Soszka

Kwaśny

Budzioch

et al. 1989

J. Phys.: Condens. Matter

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The energy spectra of electrons induced by xenon ion bombardment of the Fe-Ni alloy target covered by frozen xenon were measured. Three broad maxima superimposed on the background which ranges from zero to a few hundred electron volts were observed. Excluding the first maximum which is a typical maximum of bulk electrons from the metal the yield of electrons shows some angular anisotropy in the region of large detection angles. It is assumed that the emission of these electrons is connected with the creation of the symmetric quasi-molecules Xe++Xe0. The background is associated with direct ionisation of the quasi-molecules during the approach of the collision particles, and the structure of the energy spectrum with outer-shell and inner-shell molecular auto-ionisation processes. The presence of the xenon condensed layer on the metal target was tested by energy analysis of the back-scattered neon ions. The xenon peak and the so-called double-scattering maximum which is attributed to the solid state were found on the energy distribution curve.

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Interaction of Neutral Atoms with a Solid Surface

Cited by 6 publications

References 0 publications

Characterization of neutral beam source using dc cold cathode discharge and its application processes

Characterization of neutral beam source using dc cold cathode discharge and its application processes

Plasmonic effects in the neutralization of slow ions at a metallic surface

Ion-electron emission from a cold metal target covered by xenon

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