2000
DOI: 10.1016/s0022-3093(00)00084-3
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Interaction of H2 with strained rings at the silica surface from ab initio calculations

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Cited by 30 publications
(29 citation statements)
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“…Calculating the energy of the planar ring and a relaxed puckered OH-terminated four-ring cluster at exactly the same level of theory reported in Ref. 17 verifies that the planar ring is an energetically higher-lying minima. We also note that the reported O-Si-O angles of 138°in Ref.…”
Section: Discussionsupporting
confidence: 59%
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“…Calculating the energy of the planar ring and a relaxed puckered OH-terminated four-ring cluster at exactly the same level of theory reported in Ref. 17 verifies that the planar ring is an energetically higher-lying minima. We also note that the reported O-Si-O angles of 138°in Ref.…”
Section: Discussionsupporting
confidence: 59%
“…In contrast, the study in Ref. 17, using the B3LYP functional and DFT cluster subtractive calculations, gives a relatively low two-ring strain energy of 1.42 eV. In these calculations it is assumed that a symmetric planar OH-terminated four-ring ͑Si 4 O 4 ͒ is a suitable U system.…”
Section: Discussionmentioning
confidence: 95%
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“…The strain energy of a relaxed two-ring has been estimated by numerous high-level calculations in the literature, all giving similar values. Cluster DF calculations using hydrogen-terminated two-rings yield relatively high estimates (0:72 eV=SiO 2 [16]) but neglect the stabilizing effect of an extended silica bonding environment [17]. Periodic DF calculations on two-rings in a relaxed amorphous silica surface give a value of 0:69 eV=SiO 2 [6], while similar calculations comparing the energy of silica-w to that of -quartz, yield 0:62 eV=SiO 2 [18].…”
mentioning
confidence: 94%