“… 57 Nanofabrication is crucial for the development of nanosensors and their applications. 58 Conventional methods like e-beam, focused ion beam (FIB), and photolithography are costly, time-consuming, and lack scalability due to their serial writing and imaging nature. 59 However, nanoimprint lithography (NIL) offers a promising alternative, generating nanoscale patterns at a low cost and high throughput.…”