2008
DOI: 10.1021/nl802292h
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Integratable Nanowire Transistors

Abstract: We report a structure to control nanowire location and growth direction and demonstrate top-gated, metal-oxide-semiconductor, field-effect transistors (MOSFETs) using this structure. The nanowires wereengineered to grow against an oxide surface of a (001), silicon-on-insulator substrate, enabling straightforward fabrication of MOSFETs exhibiting an Io/Ioff ratio approximately 104 and a subthreshold slope of approximately 155 mV/decade. Though nanowires were engineered to grow in (110) directions, the nanowires… Show more

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Cited by 55 publications
(50 citation statements)
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“…Granted that the technological momentum is helping to provide any kind of 1-D nanomaterials on any substrate, it becomes obvious that we must now look for ways to take advantage of them in designing devices for applications in high-speed electronics, photonics, energy conversion, sensing, and imaging by incorporating a collection of materials on any substrate. The functionality of conventional electronics (e.g., CMOS technology) and photonics can be significantly augmented by using 1-D self-assembled NWs as device channels [11], light emitters, and detectors [68]- [70].…”
Section: E Nanowire Heteroepitaxymentioning
confidence: 99%
“…Granted that the technological momentum is helping to provide any kind of 1-D nanomaterials on any substrate, it becomes obvious that we must now look for ways to take advantage of them in designing devices for applications in high-speed electronics, photonics, energy conversion, sensing, and imaging by incorporating a collection of materials on any substrate. The functionality of conventional electronics (e.g., CMOS technology) and photonics can be significantly augmented by using 1-D self-assembled NWs as device channels [11], light emitters, and detectors [68]- [70].…”
Section: E Nanowire Heteroepitaxymentioning
confidence: 99%
“…The field-effect mobility of the nanowire device using various nanowire materials and processes is between 6.93 and 510 cm 2 /(V · s) [9]- [11]. In addition, the field-effect mobility of an a-Si thin-film transistor, which is applied in the present display system, is less than 1 cm 2 /(V · s).…”
Section: Characteristics Of the Nanowire Transistormentioning
confidence: 99%
“…Recently, the HP group has advanced this technique to realize a top-gated MOSFET (Quitoriano & Kamins, 2008). Fig.…”
Section: Wwwintechopencommentioning
confidence: 99%