2022
DOI: 10.35848/1882-0786/ac466a
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Insulator-to-semiconductor conversion of solution-processed ultra-wide bandgap amorphous gallium oxide via hydrogen annealing

Abstract: Developing semiconducting solution-processed ultra-wide bandgap (UWB) amorphous oxide semiconductor (AOS) is an emerging area of research interest. However, obtaining electrical conduction on it is quite challenging. Here, we demonstrate the insulator-to-semiconductor conversion of solution-processed a-Ga2Ox (Eg~4.8 eV) through hydrogen annealing. The successful conversion was reflected by the switching thin-film transistor (TFT) with μsat of 10-2 cm2/Vs. We showed that H incorporated after hydrogen annealing … Show more

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Cited by 8 publications
(25 citation statements)
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References 27 publications
(30 reference statements)
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“…This is due to H doping introduction which acts as a shallow donor and further improve the electron carrier concentration. Additional states below CBM (donor states) were created and narrowed the Eg [4,9].…”
Section: -2 / D Purnawati • Student Papermentioning
confidence: 99%
See 1 more Smart Citation
“…This is due to H doping introduction which acts as a shallow donor and further improve the electron carrier concentration. Additional states below CBM (donor states) were created and narrowed the Eg [4,9].…”
Section: -2 / D Purnawati • Student Papermentioning
confidence: 99%
“…It can be either narrowing or widening [3]. In other words, bandgap engineering can be performed to increase the carrier concentration which implies EF shifting closer to CBM [4]. However, experimental methods need complex optimization and time-consuming to obtain the optimize experimental parameters.…”
Section: Introductionmentioning
confidence: 99%
“…Ultrawide-bandgap (UWB) oxide semiconductors have gained attention for optoelectronic device applications due to their unique combination of electrical conductivity and optical transparency. Among various UWB materials, amorphous gallium oxide (a-Ga 2 O x ) is the most superb candidate for future device applications due to its UWB ( E g > 4.0 eV), excellent uniformity and transparency, high breakdown voltage, and flexibility in device design . It has been widely used in various devices such as thin-film transistors (TFTs), , sensors, and solar-blind photodetectors (SBPDs). In particular, a-Ga 2 O x SBPDs exhibit considerable device performance as compared to β-Ga 2 O 3 . In selected cases, a-Ga 2 O x -based SBPDs exhibit higher responsivity than their β-Ga 2 O 3 counterpart. Fast response speeds in a-Ga 2 O x SBPDs approaching those of single-crystal Ga 2 O 3 have also been demonstrated through reduction of oxygen vacancies, which act as deep traps in a-Ga 2 O x and consequently induce a persistent photoconductivity effect .…”
Section: Introductionmentioning
confidence: 99%
“…One method to measure the n of materials is through Hall effect measurement. However, due to equipment limitations, it was found that measuring n for UWB a-Ga 2 O x material is problematic . Relatively low n and high resistivity of a-Ga 2 O x make it difficult to measure.…”
Section: Introductionmentioning
confidence: 99%
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