Installation of a technological center for highly efficient optical gratings at Helmholtz-Zentrum Berlin (HZB)

Loechel, B.; Erko, A.; Lemke, Stephanie; Nelles, B.; Schmidt, Marco; Senf, F.

doi:10.1088/1742-6596/425/21/212012

Cited by 9 publications

(7 citation statements)

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“…The groove placement accuracy control for constant pitch or for line density variation (in the case of a VLS grating) is measured by the use of a groove density measurement set-up (VDI/VDE 5575, 2011b) available at HZB. A fast qualitative check to monitor this parameter is possible by aligning the grating under the Littrow condition in front of a Fizeau phase-shifting interferometer which allows viewing of the quality of the wavefront in higher diffraction order (Loechel et al, 2013).…”

Section: Ex Situ Characterization Of Grating Blanks and Gratingsmentioning

confidence: 99%

Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin

et al. 2018

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Blazed gratings are of dedicated interest for the monochromatization of synchrotron radiation when a high photon flux is required, such as, for example, in resonant inelastic X-ray scattering experiments or when the use of laminar gratings is excluded due to too high flux densities and expected damage, for example at free-electron laser beamlines. Their availability became a bottleneck since the decommissioning of the grating manufacture facility at Carl Zeiss in Oberkochen.To resolve this situation a new technological laboratory was established at the Helmholtz Zentrum Berlin, including instrumentation from Carl Zeiss. Besides the upgraded ZEISS equipment, an advanced grating production line has been developed, including a new ultra-precise ruling machine, ion etching technology as well as laser interference lithography. While the old ZEISS ruling machine GTM-6 allows ruling for a grating length up to 170 mm, the new GTM-24 will have the capacity for 600 mm (24 inch) gratings with groove densities between 50 lines mm À1 and 1200 lines mm À1. A new ion etching machine with a scanning radiofrequency excited ion beam (HF) source allows gratings to be etched into substrates of up to 500 mm length. For a final at-wavelength characterization, a new reflectometer at a new Optics beamline at the BESSY-II storage ring is under operation. This paper reports on the status of the grating fabrication, the measured quality of fabricated items by ex situ and in situ metrology, and future development goals.

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Section: Ex Situ Characterization Of Grating Blanks and Gratingsmentioning

confidence: 99%

Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin

et al. 2018

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“…1) were produced at the grating laboratory of the Helmholtz Zentrum Berlin (HZB) (Siewert et al, 2018). The gratings are mechanically ruled, using a Zeiss GTM-6 ruling machine (Loechel et al, 2013). For this the silicon substrates were coated with gold as a ruling layer.…”

Section: Samplesmentioning

confidence: 99%

Damage thresholds for blaze diffraction gratings and grazing incidence optics at an X-ray free-electron laser

Krzywiński

Conley

Moeller

et al. 2018

J Synchrotron Radiat

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The Linac Coherent Light Source is upgrading its machine to high repetition rate and to extended ranges. Novel coatings, with limited surface oxidation, which are able to work at the carbon edge, are required. In addition, highresolution soft X-ray monochromators become necessary. One of the big challenges is to design the mirror geometry and the grating profile to have high reflectivity (or efficiency) and at the same time survive the high peak energy of the free-electron laser pulses. For these reasons the experimental damage threshold, at 900 eV, of two platinum-coated gratings with different blazed angles has been investigated. The gratings were tested at 1 grazing incidence. To validate a model for which the damage threshold on the blaze grating can be estimated by calculating the damage threshold of a mirror with an angle of incidence identical to the angle of incidence on the grating plus the blaze angle, tests on Pt-coated substrates have also been performed. The results confirmed the prediction. Uncoated silicon, platinum and SiB 3 (both deposited on a silicon substrate) were also investigated. In general, the measured damage threshold at grazing incidence is higher than that calculated under the assumption that there is no energy transport from the volume where the photons are absorbed. However, it was found that, for the case of the SiB 3 coating, the grazing incidence condition did not increase the damage threshold, indicating that the energy transport away from the extinction volume is negligible.

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“…In order to support our in-house developments on new concepts of XUV optical elements (Hafner et al, 2015;Loechel et al, 2013;Senf et al, 2016;Chkhalo et al, 2017;Braig et al, 2017;Siewert et al, 2018;Erko et al, 2010), a versatile UHV reflectometer has been permanently installed as an endstation at the optics beamline at the BESSY-II synchrotron radiation source. The optical concept and design features of this facility have been described elsewhere Schä fers et al, 2016).…”

Section: Introductionmentioning

confidence: 99%

Efficient high-order suppression system for a metrology beamline

Sokolov

Сертсу

Gaupp

et al. 2018

J Synchrotron Radiat

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High-quality metrology with synchrotron radiation requires in particular a very high spectral purity of the incident beam. This is usually achieved by a set of transmission filters with suitable absorption edges to suppress high-order radiation of the monochromator. The at-wavelength metrology station at a BESSY-II bending-magnet collimated plane-grating monochromator (c-PGM) beamline has recently commissioned a high-order suppression system (HiOS) based on four reflections from mirrors which can be inserted into the beam path. Two pairs of mirrors are aligned parallel so as not to disturb the original beam path and are rotated clockwise and counter-clockwise. Three sets of coatings are available for the different energy ranges and the incidence angle is freely tunable to find the optimum figure of merit for maximum suppression at maximum transmission for each photon energy required. Measured performance results of the HiOS for the EUV and XUV range are compared with simulations, and applications are discussed.

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Installation of a technological center for highly efficient optical gratings at Helmholtz-Zentrum Berlin (HZB)

Cited by 9 publications

References 0 publications

Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin

Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin

Damage thresholds for blaze diffraction gratings and grazing incidence optics at an X-ray free-electron laser

Efficient high-order suppression system for a metrology beamline

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