“…To this end, many synthesis techniques such as plasma sputtering deposition have been investigated, including conventional magnetron, high-power impulse magnetron sputtering, and magnetron gas aggregation source depositions [4][5][6][7]. Since these deposition processes are of atomic nature, the description and insights into targeted growth processes to improve NP morphology, structure, and properties can successfully be explored using atomistic simulations, especially molecular dynamics [8][9][10][11][12][13][14][15][16]. Both growth in inert and reactive plasma environments has, thus, been shown feasible.…”