Inkjet coating combined with nanoimprinting for complex 3D patterns with progressive height increase and low residual layer
Thomas Achleitner,
Johanna Rimböck,
Lisa Vsetecka
et al.
Abstract:This manuscript investigates the use of Nanoimprint Lithography (NIL) for the development of devices in semiconductor, photonic, and biomedical industries. It focuses on the SmartNIL® process, a method for patterning nanostructures on various materials. The study highlights the advantages of NIL, such as mass production of micro-and nano-scale structures, and the replication of complex structures. The manuscript discusses the importance of a precisely controlled and uniform residual layer for optimizing the op… Show more
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