Initiated chemical vapor deposition polymers for high peak-power laser targets

Baxamusa, Salmaan H.; Lepró, Xavier; Lee, Tom; Worthington, Matthew; Ehrmann, Paul; Laurence, Ted A.; Teslich, Nick E.; Suresh, Aravind; Burkey, Daniel D.

doi:10.1016/j.tsf.2016.11.055

Cited by 6 publications

(4 citation statements)

References 16 publications

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“…5e). 102 Using a method related to iCVD, provides a new means of altering the 3D nanostructure of a self-assembled block copolymers. 103 Vapors of monomer and initiators infiltrate and swell one of the blocks, which are then photopolymerized.…”

Section: Organic and Hybrid Devicesmentioning

confidence: 99%

Nanoscale control by chemically vapour-deposited polymers

Gleason

2020

Nat Rev Phys

104

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Section: Organic and Hybrid Devicesmentioning

confidence: 99%

Nanoscale control by chemically vapour-deposited polymers

Gleason

2020

Nat Rev Phys

104

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“…Thin films of cross-linked polymer networks fabricated by initiated chemical vapor deposition (iCVD) have utility in a broad variety of applications including (1) integrated circuit fabrication, , (2) surface energy modification, , (3) ablator materials for nuclear fusion, − and (4) electrochemical power systems. − Conventional solution synthesis techniques require multiple steps to form cross-linked polymer films adhered to substrates. Usually a polymer with incorporated cross-linkable moieties is first synthesized and then either spin- or dip-coated on the substrate of interest.…”

Section: Introductionmentioning

confidence: 99%

“…Next, we ascertain the pendant vinyl bond conversion using Fourier transform infrared (FTIR) spectroscopy of the pDVB films. In the previously described iCVD studies, increased vinyl bond conversion resulted in improved mechanical properties associated with higher degrees of cross-linking. ,,, Therefore, we focus on the mechanism of pendant vinyl bond conversion and the associated limiting processes as a function of temperature and deposition rate. Finally, the dependence of the film morphology on temperature and deposition rate is investigated.…”

Section: Introductionmentioning

confidence: 99%

Growth Rate and Cross-Linking Kinetics of Poly(divinyl benzene) Thin Films Formed via Initiated Chemical Vapor Deposition

2018

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Initiated chemical vapor deposition (iCVD) allows for the formation of highly cross-linked, polymer thin films on a variety of substrates. Here, we study the impact of substrate stage temperature and filament temperature on the deposition and cross-linking characteristics of iCVD from divinyl benzene. Maintaining a constant monomer surface concentration reveals that deposition rates upward of 15 nm/min can be achieved at substrate stage temperatures of 50 °C. The degree of cross-linking is limited by the rate of initiation of the pendant vinyl bonds. At a filament temperature of 200 °C, the pendant vinyl bond conversion is highly sensitive to the surface concentration of initiator radicals. A significant decrease of the pendant vinyl bond conversion is observed with increasing stage temperatures. At higher filament temperatures, the pendant vinyl bond conversion appears to plateau at approximately 50%. However, faster deposition rates yield lower conversion. This trade-off is mitigated by increasing the filament temperature to increase initiator radical production. A higher flux of initiator radicals toward the surface at a constant deposition rate increases the rate of initiation of pendant vinyl bonds and therefore their overall conversion. At a deposition rate of ∼7 nm/min, an increase in the filament temperature from 200 to 240 °C results in an 18% increase in the pendant vinyl bond conversion.

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“…iCVD PDVB has been used as a pore narrower or a binding layer for iCVD P(PFDA) top coatings for hydrophobicity‐based applications . Baxamusa et al investigated the potential of iCVD PDVB as an ablator material for inertial confinement fusion . The use of iCVD PDVB for nanofabrication has also been explored.…”

Section: Introductionmentioning

confidence: 99%

Stabilizing the Wettability of Initiated Chemical Vapor Deposited (iCVD) Polydivinylbenzene Thin Films by Thermal Annealing

Zhao

Wang

Gleason

2017

Adv Materials Inter

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Maintaining stable surface properties, such as wetting, remains a challenge for many applications of functional coatings. Here, this paper reports a study on the stability of the surface properties of polydivinylbenzene (PDVB). The PDVB thin films are synthesized via initiated chemical vapor deposition (iCVD). The decrease of receding water contact angles and increase of contact angle hysteresis of iCVD PDVB over time are found to be related with surface oxidation during air exposure. Fourier transform infrared and X‐ray photoelectron spectroscopy reveal the generation carbonyl and epoxy groups and the consumption of pendant vinyl groups in the oxidation process. A modified first‐order kinetic model describes the dynamic process, and the apparent reaction rate constant for the oxidation of iCVD PDVB is 0.0238–0.0294 h−1. In order to inhibit the oxidation and stabilize the wettability of iCVD PDVB, an in situ thermal annealing process is developed. This thermal treatment is effective in improving the cross‐linking degree of iCVD PDVB, slowing down the rate of oxidation, and therefore significantly enhancing the long‐term wettability. The advancing and receding contact angles of annealed iCVD PDVB are stable even after exposure to air for two months. The reported thermal annealing approach also improves the mechanical properties of iCVD PDVB.

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Initiated chemical vapor deposition polymers for high peak-power laser targets

Cited by 6 publications

References 16 publications

Nanoscale control by chemically vapour-deposited polymers

Nanoscale control by chemically vapour-deposited polymers

Growth Rate and Cross-Linking Kinetics of Poly(divinyl benzene) Thin Films Formed via Initiated Chemical Vapor Deposition

Stabilizing the Wettability of Initiated Chemical Vapor Deposited (iCVD) Polydivinylbenzene Thin Films by Thermal Annealing

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