We investigate hole transport through a submicron-size channel fabricated from a modulation-doped p-type GaAs/͑AlGa͒As single-quantum-well heterostructure. The intense electric field in the channel accelerates the holes beyond the inflection point of the lowest energy subband dispersion curve. This leads to current saturation and negative differential conduction effects in the currentvoltage characteristics. © 2003 American Institute of Physics. ͓DOI: 10.1063/1.1543643͔The energy-wave vector, (k), dispersion curves of holes in a quantum well ͑QW͒ are highly nonparabolic due to the admixing of the heavy-hole ͑HH͒ and light-hole ͑LH͒ subbands by spin-orbit interaction.1,2 In particular, the lowest-energy subband ͑HH1͒ has an inflection point in (k), corresponding to a maximum hole velocity, phenomenologically similar to that found for Bloch electrons in superlattices.3 At energies above this point, the subband has a region with negative effective mass ͑NEM͒. It has been proposed that this property can be exploited to develop a class of high-frequency ͓terahertz ͑THz͔͒ generators and detectors in which ballistic holes are accelerated by an intense electric field to their peak velocity in a submicron high-field device. 4 Alternatively, optical excitation of holes followed by radiative intersubband relaxation could be used as a source of THz radiation.
5In this letter, we investigate hot-hole transport through a submicron-size channel fabricated from a modulation-doped p-type GaAs/͑AlGa͒As single QW heterostructure. Studies of hole transport through narrow constrictions have been reported previously and have shown quantized conductance effects. 6 Here, we show that holes can be accelerated up to and beyond the inflection point in the highly nonparabolic HH1 subband of the QW, thus leading to current saturation and negative differential conduction effects in the currentvoltage characteristics.The GaAs/Al 0.3 Ga 0.7 As heterostructure was grown by molecular beam epitaxy on a semi-insulating ͑SI͒, ͑311͒A-oriented GaAs substrate. It consists of a 15 nm wide QW, modulation-doped with Si acceptors. Transport measurements in standard Hall bars at Tϭ1.2 K gave a hole mobility ϭ50 m 2 /V s and a sheet density pϭ2.1ϫ10 15 m Ϫ2 for the two-dimensional hole gas ͑2DHG͒.Using electron beam lithography, the layer was processed into a four-terminal device in which holes can flow through a narrow constriction between contacts 1 and 3 or 2 and 4 ͑see Fig. 1͒. The constriction is formed by dry etching the heterostructure down to the SI substrate. The contact pads allow us to make four-terminal measurements so that the effect of contact resistances can be eliminated. In the current-voltage characteristic, I(V), shown in Fig. 2͑a͒, the voltage V comprises the potential drop across the short and narrow constriction and across the larger low-resistance tapered areas between the constriction and the contact pads. We studied several structures with different geometrical constriction widths, w, and/or pitch angles, ⌰ ͑see Fig. 1͒. Here, we fo...