2002
DOI: 10.1063/1.1478800
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Initial growth stages of epitaxial BaTiO3 films on vicinal SrTiO3 (001) substrate surfaces

Abstract: The initial growth mechanism of epitaxial BaTiO 3 films is studied by combined application of atomic force microscopy, cross sectional high-resolution transmission electron microscopy, and x-ray diffraction. Epitaxial BaTiO 3 thin films were grown by pulsed laser deposition on vicinal Nb-doped SrTiO 3 (SrTiO 3 :Nb) ͑001͒ substrates with well-defined terraces. X-ray diffraction and cross sectional high-resolution transmission electron microscopy investigations revealed well-defined epitaxial films and a sharp i… Show more

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Cited by 50 publications
(26 citation statements)
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“…Figs. 3(a) and (b) summarize the evolution of surface and interface roughness in situ from superlattices with d ¼ 2; 6, and 20 nm against N. From the multilayer stack with the dp6 nm and N ¼ 125; the surface and interface roughness are maintained at a value about 0.28 nm ($0.25 nm for a bare STO substrate); this condition might be a consequence of the repetition of two-dimensional nucleation and growth of BTO and LNO sublayers on the flat terrace of the STO substrate, as proposed by Visinoiu et al [14] and Terashima et al [15]. As d reaches 20 nm hence larger than the critical thickness, the surface and interface roughness increase largely relative to that with dp6 nm; due to strain relief in the multilayer stack.…”
Section: Article In Pressmentioning
confidence: 96%
“…Figs. 3(a) and (b) summarize the evolution of surface and interface roughness in situ from superlattices with d ¼ 2; 6, and 20 nm against N. From the multilayer stack with the dp6 nm and N ¼ 125; the surface and interface roughness are maintained at a value about 0.28 nm ($0.25 nm for a bare STO substrate); this condition might be a consequence of the repetition of two-dimensional nucleation and growth of BTO and LNO sublayers on the flat terrace of the STO substrate, as proposed by Visinoiu et al [14] and Terashima et al [15]. As d reaches 20 nm hence larger than the critical thickness, the surface and interface roughness increase largely relative to that with dp6 nm; due to strain relief in the multilayer stack.…”
Section: Article In Pressmentioning
confidence: 96%
“…A variety of deposition techniques including molecular-beam epitaxy (MBE) [5,6], laser MBE [7], atomic layer MOCVD [8], and pulsedlaser deposition [9,10] have been successfully used to grow epitaxial superlattice films of ferroelectric oxides. For these methods, a high temperature ($650 1C) is necessary to obtain epitaxial superlattice films of high quality [5][6][7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…This is, however, true only for films with thicknesses below a certain critical value (t c ), above which the strain relaxation via defect formation occurs. This thickness depends on the lattice mismatch between the film and the substrate [8,9]: for example, in BaTiO 3 on SrTiO 3 (in-plane mismatch of 2.4%) a t c ≈ 2-4 nm has been experimentally determined [10,11]. But at such small film thicknesses polarization measurements are hindered by high tunnelling and/or leakage currents.…”
mentioning
confidence: 99%