2006
DOI: 10.1016/j.corsci.2005.05.022
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Inhibition of localized corrosion for stainless steels in low-level radioactive water containing chloride

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Cited by 9 publications
(11 citation statements)
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“…The inhibitive effect may be affected by the size and the bond strength of the adsorbed molecule and in dislodging chloride from the sites through which it preferentially penetrates the passive oxide layer (Bellanger, 2006;Ilevbare & Burstein, 2003;Ilevbare et al, 2005). An inhibitor may penetrate or be pulled through the oxide fi lm under the infl uence of the electric fi eld provided that it is not much larger than Cl -.…”
Section: Mechanisms Of Inhibition Of the Localized Corrosionmentioning
confidence: 97%
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“…The inhibitive effect may be affected by the size and the bond strength of the adsorbed molecule and in dislodging chloride from the sites through which it preferentially penetrates the passive oxide layer (Bellanger, 2006;Ilevbare & Burstein, 2003;Ilevbare et al, 2005). An inhibitor may penetrate or be pulled through the oxide fi lm under the infl uence of the electric fi eld provided that it is not much larger than Cl -.…”
Section: Mechanisms Of Inhibition Of the Localized Corrosionmentioning
confidence: 97%
“…These inhibitors may suppress the activity at weak points in the oxide. A blocking effect by competitive adsorption with chloride ions is also suggested (Bellanger, 2006).…”
Section: Inhibitors For the Localized Corrosion Of Stainless Alloysmentioning
confidence: 97%
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“…Graph of derivative versus time-delay ( Fig. 11(a-d)) for random oscillations produces a plot with discernible structure in form of elongated core toroid indicating an unstable system [34]. In Fig.…”
Section: Electrochemical Noisementioning
confidence: 98%
“…10 and Table 3). These oscillations are due to the nucleation of unstable species in active and prepassive regions and repair process associated with the propagating stress [28,34] and changes in the composition of the oxide surface. Stress of the oxide layer is caused by non stable Ti II and Ti III presence in oxide [10], whereas stable oxide layer is caused by total Ti IV formation.…”
Section: Electrochemical Noisementioning
confidence: 99%