2011
DOI: 10.1021/am1011518
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Inherently Reproducible Fabrication of Plasmonic Nanoparticle Arrays for SERS by Combining Nanoimprint and Copolymer Lithography

Abstract: We present an inherently reproducible route to realizing high-performance SERS substrates by exploiting a high-throughput top-down/bottom-up fabrication scheme. The fabrication route employs self-assembly of amphiphilic copolymers to create high-resolution molds for nanoimprint lithography (NIL) spanning entire 100 mm Si wafers. The nanoporous polymer templates obtained upon NIL are subjected to galvanic displacement reactions to create gold nanorod arrays. Nanorods are subsequently converted to nanodiscs by t… Show more

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Cited by 61 publications
(60 citation statements)
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“…The SERS signal intensity significantly depends on the molecular characteristics and on the nature of the interaction of the molecules with the substrate. 23 The band at 1624 cm −1 for the MB concentration of 1 μM shifts to the band at 1622 cm −1 for the MB concentration of 1.5 mM in SERS signal. The aggregation effect seems to occur in this case.…”
Section: Sers Characterization Of Ag Nanodot Arraymentioning
confidence: 90%
“…The SERS signal intensity significantly depends on the molecular characteristics and on the nature of the interaction of the molecules with the substrate. 23 The band at 1624 cm −1 for the MB concentration of 1 μM shifts to the band at 1622 cm −1 for the MB concentration of 1.5 mM in SERS signal. The aggregation effect seems to occur in this case.…”
Section: Sers Characterization Of Ag Nanodot Arraymentioning
confidence: 90%
“…The uniform templates obtained using reverse micelle approach is well-suited as masks for nanolithography to produce Si nanopillar arrays. These nanopillar arrays are highly interesting for exploitation as high-resolution molds for nanoimprint lithography (NIL) [44]. NIL is a convenient top-down patterning tool that allows replication of surface relief structures down to sub-10 nm feature sizes present in a mold into the polymer substrate [24,92].…”
Section: Nanorods and Nanodisc Arrays From Nanoimprint Lithography Frmentioning
confidence: 99%
“…Due to the difficulty in reproducibly preparing nanostructures, many planar SERS substrates must be synthesized using a variety of sequential complex photolithographic techniques borrowed from the silicon wafer industry. These methods include techniques such as using electron beam deposition (EBD) to create the nanorough surface itself [90,119], using EBD to produce "nanostamps" [120], combining nanoimprint and copolymer lithographic techniques [121], using selfassembled nanoparticles (SAMs) [122,123], and many others using non-spherical particles such as Au-and Agcoated nanorod arrays [124,125]. These techniques, specifically EBD, produce high-resolution nanostructures that are reproducible within a wafer; however, there is a tradeoff with high reproducibility and low enhancement factor (10 2 - 10 4 ) [126].…”
Section: Nanoparticles As Sers Substratesmentioning
confidence: 99%