“…1-6 In particular, researchers are currently making efforts to develop highly bright LEDs for white LEDs. 7,8 To increase the efficiency of the conventional GaNbased LED, attempts have been made to change the top electrode structure and to optimize the multi-quantum well layer, by using an indium tin oxide ͑ITO͒ contact instead of the traditional thin metal to p-type contact, through surface texturing, etc. [9][10][11] However, many difficulties were encountered in the surface texturing and the formation of a transparent electrode on the p-GaN layer, in the case of the conventional GaN device having p-GaN on the top of the device, due to various problems such as the high sensitivity of p-GaN to plasma damage, the p-GaN top layer being too thin for texturing, the high contact resistance of ITO to p-GaN, etc.…”