In atomic layer deposition (ALD) of Al 2 O 3 thin films using trimethylaluminum (TMA) and water, it is generally believed that the surface methyl species formed by chemical adsorption of TMA are sufficiently water-reactive to produce surface hydroxyls. However, recently, there have been several reports on the presence of persistent methyl species in the water exposure step during the Al 2 O 3 ALD process. Here, we performed in situ Fourier-transform infrared spectroscopic analysis to provide evidence that the surface methylated by TMA retains the water-stable methyl species on the surface after exposure to water. The C−H stretching mode of the waterstable methyl species appears at ∼2960 cm −1 with a higher wavenumber compared to that of the reactive methyl species (∼2940 cm −1 ). Furthermore, the water-stable (persistent) methyl species can be chemically probed with ozone (O 3 ) because ozone reacts with the persistent methyl species to form formate species. During the chemical probing by exposing the persistent methyl species to ozone, the C−H stretching mode of the persistent methyl species disappears at ∼2960 cm −1 and the asymmetric stretching mode of the formate species is observed at ∼1609 cm −1 . This reveals that the persistent methyl groups are consumed to form the formate species by the chemical probing with ozone. In addition, we propose a plausible reaction between the surface formate species and TMA, which may explain the observations made by the in situ FTIR investigation.