2000
DOI: 10.1016/s0022-3093(99)00855-8
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Infrared photoluminescence from Er-doped a-GaAsN alloys

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Cited by 2 publications
(2 citation statements)
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“…Red electroluminescence at 650 nm has also been reported in Pr 3+ -doped GaN [3]. The most frequently investigated semiconductor materials including amorphous and crystalline hosts are GaN [1][2][3], AlN [4], GaP [5], SiN [6][7][8][9], and GaAsN [10]. The proposed applications for RE-doped wide-band-gap semiconductors in the visible range are, for example, in visiblelight-emitting diodes and full colour displays [3,6,7].…”
Section: Introductionmentioning
confidence: 99%
“…Red electroluminescence at 650 nm has also been reported in Pr 3+ -doped GaN [3]. The most frequently investigated semiconductor materials including amorphous and crystalline hosts are GaN [1][2][3], AlN [4], GaP [5], SiN [6][7][8][9], and GaAsN [10]. The proposed applications for RE-doped wide-band-gap semiconductors in the visible range are, for example, in visiblelight-emitting diodes and full colour displays [3,6,7].…”
Section: Introductionmentioning
confidence: 99%
“…A inserção de íons Er 3+ deu-se durante o processo de deposição e a proporção da mistura gasosa Ar+N 2 foi intencionalmente variada a fim de induzir alterações sistemáticas no bandgap do material. Os resultados deste estudo foram objeto de uma publicação em 1999 [74] − ver quadro a seguir, e apresentados em uma conferência internacional [75]. Basicamente, e em estreita correlação com o trabalho a respeito da extinção do sinal de PL [59], foi possível verificar a dependência da intensidade de emissão devida aos íons Er 3+ (em ~ 1540 nm) com o bandgap óptico do a-GaAsN.…”
Section: Parte 3 -Outros Materiais 3a -Filmes De A-gaasnunclassified