Informational Lithography Approach Based on Source and Mask Optimization

Ma, Xu; Pan, Yihua; Zhang, Shengen; Garcia-Frías, Javier; Arce, Gonzalo R.

doi:10.1109/tci.2020.3048271

Cited by 7 publications

(2 citation statements)

References 24 publications

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“…The second adverse case is structures composed of multiple junctions. For a structure with M 1 junctions, the complexity of RCWA is M 1 O N 3 1 , in which N 1 is the number of plane waves in RCWA. In contrast, the numerical complexity for the proposed method is M 2 O N 1.5 2 , in which M 2 is the required iteration number for solving the block matrix problem in equation (34) and N 2 is the unknown number with finite difference modelling.…”

Section: E Numerical Complexitymentioning

confidence: 99%

“…In contrast, the numerical complexity for the proposed method is M 2 O N 1.5 2 , in which M 2 is the required iteration number for solving the block matrix problem in equation (34) and N 2 is the unknown number with finite difference modelling. This means RCWA method needs to conduct O N 3 1 computation for M 1 times. Even though M 2 is apparently larger than M 1 , the overall complexity is maintained at O(N 1.5 ) level.…”

Section: E Numerical Complexitymentioning

confidence: 99%

See 1 more Smart Citation

A Hybrid Eigenmode Restoration Algorithm for Computational Lithography Problems Based on Mode Matching Principle

Liu

et al. 2022

IEEE Access

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The mode matching method is an efficient solution to conventional microwave waveguide problems for its dimensionality advantages. It is theoretically extendable to computational lithography problems in nano scales with periodic boundary condition. The high computational complexity of conventional mode matching limits its application significance in highly complicated nano scale problems. This paper introduces an optimized efficient mode matching method for computational lithography problems whose complexity is O(N 1.5 ). This bottleneck is breached by transforming governing equations with Lanczos algorithm. A novel hybrid eigenmode restoration algorithm is proposed to solve the eigenmode accuracy loss by involving the Arnoldi method. Benchmark cases verify the accuracy of the restored eigenmode and mode matching method with from microwave to nano scale problems. The efficiency is further optimized by exploring the relevance between iteration step and structure complexity. The non-uniform iteration step is introduced for efficiency optimization. A real mask component is modelled as a multi-junctional waveguide structure with periodic boundary condition. Simulation results validate the effectiveness of the proposed method and efficiency benefits are discussed through comparison with other solvers including HFSS and RCWA. Results indicate that the proposed method possesses good flexibility and application significance for computational lithography problems with high complexity.

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Section: E Numerical Complexitymentioning

confidence: 99%

Section: E Numerical Complexitymentioning

confidence: 99%