2008
DOI: 10.1016/j.electacta.2007.09.046
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Influences of structure and composition on the photoelectrochemical behaviour of anodic films on Zr and Zr–20at.%Ti

Abstract: A photoelectrochemical investigation on anodic films of different thickness grown on sputter-deposited Zr and Zr-20 at.%Ti was carried out. The estimated optical band gap and flat band potential of thick (U F ≥ 50 V) anodic films were related to their crystalline structure and compared with those obtained for thinner (U F ≤ 8 V/SCE) anodic oxides having undetermined crystalline structure. The E g values obtained by photocurrent spectroscopy were also compared with the experimental band gap estimated by other o… Show more

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Cited by 34 publications
(41 citation statements)
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References 61 publications
(105 reference statements)
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“…The best linear regression was observed with the values of n<1. The disclosed supralinear behavior ( 1 n >1) in the investigated potential range confirms the presence of surface and bulk recombination phenomena involving the photogenerated carriers as well as the geminate recombination effects generally occurring in the amorphous film [33]. Geminate recombination phenomenon is typical for materials containing a non-zero density of localized states near Fermi level.…”
Section: Photoelectrochemical Performance Of Electrode Smentioning
confidence: 55%
“…The best linear regression was observed with the values of n<1. The disclosed supralinear behavior ( 1 n >1) in the investigated potential range confirms the presence of surface and bulk recombination phenomena involving the photogenerated carriers as well as the geminate recombination effects generally occurring in the amorphous film [33]. Geminate recombination phenomenon is typical for materials containing a non-zero density of localized states near Fermi level.…”
Section: Photoelectrochemical Performance Of Electrode Smentioning
confidence: 55%
“…4, therefore A = 1.35 or A = 2.17 for regular d,d metals and s,p-s,p metals mixed oxides, respectively. In previous papers, [30][31][32] we have shown that conditions such as those mentioned above in the paper of Zunger et al can be encountered in practice in the case of passive films grown on valve-metals alloys where, in suitable electrolytic solutions, the oxide composition maintains the same cation ratio present in the metallic alloy. This is reported in Figures 1-3 for d,d-metals mixed oxides, where the measured optical band gaps as a function of the alloys composition are reported for passive films grown on Ti-Zr and Ta-Nb alloys as well as for physically deposited (Gd x Y (1-x) ) 2 O 3 .…”
Section: Theoretical Backgroundmentioning
confidence: 99%
“…This is reported in Figures 1-3 for d,d-metals mixed oxides, where the measured optical band gaps as a function of the alloys composition are reported for passive films grown on Ti-Zr and Ta-Nb alloys as well as for physically deposited (Gd x Y (1-x) ) 2 O 3 . [30][31][32][33][34] The amorphous nature of the passive film on Nb-Ta alloys and the absence of any indirectto-direct optical transition crossover in the case of crystalline films grown on Ti-Zr alloys, allowed testing of the suggestion of Zunger and coworkers 25,26 for the regular semiconducting alloys reported above. Figures 1 and 2 show the dependence of experimental E g values of thin anodic passive films vs alloys composition for Ti-Zr and Ta-Nb mixed oxides.…”
Section: Theoretical Backgroundmentioning
confidence: 99%
“…Further evidence in favour of the proposed corre-lation for anodic films grown on Mo-Ta, Ti-Zr, Hf-W metallic alloys can be found in Refs. [144,[146][147][148]. We have to mention that apart the nature of the oxide other experimental parameters can affect the lattice disorder degree of passive films and then the ΔE am value in anodic films.…”
Section: (Iii) Amorphous Oxide Filmsmentioning
confidence: 99%
“…We have to mention that apart the nature of the oxide other experimental parameters can affect the lattice disorder degree of passive films and then the ΔE am value in anodic films. 127,143,146 …”
Section: (Iii) Amorphous Oxide Filmsmentioning
confidence: 99%