2017
DOI: 10.1088/1748-0221/12/11/c11017
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Influence of δ p-doping on the behaviour of GaAs/AlGaAs SAM-APDs for synchrotron radiation

Abstract: This work focuses on the development and the characterization of avalanche photodiodes with separated absorption and multiplication regions grown by molecular beam epitaxy. The i-GaAs absorption region is separated from the multiplication region by a p-doped layer of carbon atoms, which ensures that after applying a reverse bias, the vast majority of the potential drops in the multiplication region. Therein, thin layers of AlGaAs and GaAs alternate periodically in a socalled staircase structure to create a per… Show more

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Cited by 7 publications
(19 citation statements)
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“…Photo-generated electrons are multiplied by the impact ionization events taking place inside the staircase multiplication region. made of 12 repetitions of a stack with a 35nm GaAs layer, a 25nm Al 0.45 Ga 0.55 As film and 20 nm of a linearly graded alloy with an Al content that is increased from 1% to 45% [1]. The resulting staircase multiplication region features a periodically modulated conduction band profile [see Fig.…”
Section: Device Structurementioning
confidence: 99%
See 1 more Smart Citation
“…Photo-generated electrons are multiplied by the impact ionization events taking place inside the staircase multiplication region. made of 12 repetitions of a stack with a 35nm GaAs layer, a 25nm Al 0.45 Ga 0.55 As film and 20 nm of a linearly graded alloy with an Al content that is increased from 1% to 45% [1]. The resulting staircase multiplication region features a periodically modulated conduction band profile [see Fig.…”
Section: Device Structurementioning
confidence: 99%
“…Next generation X-rays detectors require higher count rate and higher quantum efficiency for medium and high photon energy. Avalanche photo-diodes (APDs) in III-V compounds are very promising with respect to silicon ones thanks to the higher atomic number of the material that allows for thinner detectors and to the larger band-gap that limits the leakage current [1], [2]. However, the APD development and optimization requires an in-depth understanding of the physical mechanisms involved in the device operation [3].…”
Section: Introductionmentioning
confidence: 99%
“…The devices under investigation were grown epitaxially onto GaAs wafers by using molecular beam epitaxy (MBE) techniques. The photolitographic fabrication procedure applied to obtain the separated absorption and multiplication (SAM) APD is the one reported in [6]. A sketch of such device is shown schematically in Fig.…”
Section: Detector Growth and Fabricationmentioning
confidence: 99%
“…For these measurements the device was kept in a stainless steel and UHV compatible chamber, which in turn was placed into a dark box, whereas the APD was illuminated by a tabletop laser (λ = 532 nm). The green laser was selected such that the photo-induced charge generation was limited to the absorption region only [6], so as to have ideal conditions of charge injection close to the entrance window in the absorption region during noise characterisation. For all measurements reported here, the laser spot was always focused on the centre of the device opening.…”
Section: Set-upmentioning
confidence: 99%
“…The APDs made of GaAs/AlGaAs epitaxial layers were grown by MBE on a 500-μm-thick heavily Si-doped n-type GaAs substrate. The resulting layered structure is summarized in [6]. The minimum dose to achieve complete depletion of the multiplication region (2.5 × 10 12 cm −2 [6]) was used to fabricated the devices presented here.…”
Section: Apd Designmentioning
confidence: 99%