2021
DOI: 10.1021/acsaem.1c03322
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Influence of ZnO Magnetron Sputtering on Controlled Buildout of Zirconium-Doped ZnFe2O4/Fe2O3 Heterojunction Photoanodes for Photoelectrochemical Water Splitting

Abstract: The development of efficient photoanodes for solar fuel generation via photoelectrochemical (PEC) water splitting is becoming a bottleneck. These limitations necessitate the design of iron-containing metal oxides, like “ferrites-based electrode materials” with improved oxygen evolution kinetics, light absorptivity, and intrinsic stability, yet at a low cost. Herein, we report the in-situ formation of Zr–ZnFe2O4/Fe2O3 heterojunction (ZZFO/HT) photoelectrodes using a facile magnetron sputtering and hydrothermal … Show more

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Cited by 12 publications
(2 citation statements)
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“…These ternary oxide compounds are made of trivalent iron and divalent metal ions that occupy tetrahedral and octahedral sites in lattice built of 8 face-centered cubic lattices of oxygen atoms. Spinels have found wide use in materials for energy applications due to their tunable material properties. While ZFO has advantageous properties for PEC water splitting, it has been suggested to possess a few inherent limitations including low light absorption coefficient, poor charge transport properties, and sluggish surface reaction kinetics …”
Section: Introductionmentioning
confidence: 99%
“…These ternary oxide compounds are made of trivalent iron and divalent metal ions that occupy tetrahedral and octahedral sites in lattice built of 8 face-centered cubic lattices of oxygen atoms. Spinels have found wide use in materials for energy applications due to their tunable material properties. While ZFO has advantageous properties for PEC water splitting, it has been suggested to possess a few inherent limitations including low light absorption coefficient, poor charge transport properties, and sluggish surface reaction kinetics …”
Section: Introductionmentioning
confidence: 99%
“…Magnetron sputtering is a simple technique because it does not necessitate the use of complicated chemical reactions and is also scalable and commercially available. Further, sputtering is a preferred method due to the controlled thickness, film homogeneity, high purity of products and low substrate temperature needed [24,25]. Despite the fact that Al-doping has been investigated using a variety of different preparation methods, to the best of our knowledge, no reports of Al-doping using the magnetron sputtering approach have been described to date.…”
Section: Introductionmentioning
confidence: 99%