2005
DOI: 10.1016/j.matlet.2005.01.069
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Influence of ultrsonification in CdS thin film deposition in PCD technique

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Cited by 17 publications
(4 citation statements)
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“…For higher deposition temperature, the transmittance initially increases to 84% for the film deposited at 75 • C due to less light scattering by its smoothest surface. It decreases to about 68% at deposition temperatures above 80 • C, which may be due to either more light scattering on their rough surfaces [34,35] or the transition of the CdS phase from the cubic to hexagonal structure [4].…”
Section: Optical Propertiesmentioning
confidence: 97%
“…For higher deposition temperature, the transmittance initially increases to 84% for the film deposited at 75 • C due to less light scattering by its smoothest surface. It decreases to about 68% at deposition temperatures above 80 • C, which may be due to either more light scattering on their rough surfaces [34,35] or the transition of the CdS phase from the cubic to hexagonal structure [4].…”
Section: Optical Propertiesmentioning
confidence: 97%
“…Electroless-photochemical deposition (PCD) has also been demonstrated for the preparation of metal sulfide thin films. Soundeswaran et al prepared CdS films on indium tin oxide (ITO) glass using 1-10 mM Cd(CH 3 COO) 2 and 100 mM Na 2 S 2 O 3 solution at pH = 3.0-4.5 under irradiation of ultraviolet (UV) light (100 mW/cm 2 ) [35]. For this reaction, S and electrons were initially formed by UV-excitation of S 2 O 3 2ions and reacted with Cd metal ions to form CdS.…”
Section: Introductionmentioning
confidence: 99%
“…Structural characterization of CdS films. With different deposition conditions, CdS film can grow with cubic and hexagonal phase [15][16][17][18] . For its excellent stability CdS films are widely used for the fabrication heterojunction solar cells with CdTe [19][20] .…”
Section: Resultsmentioning
confidence: 99%