Influence of ultra-sonic frequency during substrate cleaning on the laser resistance of antireflection coatings

Gischkat, Thomas; Schachtler, Daniel; Balogh-Michels, Zoltán; Botha, Roelene; Mocker, André; Eiermann, B.; Günther, Sven

doi:10.1117/12.2536442

Cited by 2 publications

(2 citation statements)

References 4 publications

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“…Laser-damage testing was performed using a Litron LPYG-450-100 diode-pumped laser at 355 nm [26]. The repetition rate was 100 Hz, while the pulse duration was 11.6 ns.…”

Section: Laser-damage Testingmentioning

confidence: 99%

Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold

Balogh-Michels

Stevanovic

Borzì³

et al. 2021

J. Eur. Opt. Soc.-Rapid Publ.

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In this work, we present our results about the thermal crystallization of ion beam sputtered hafnia on 0001 SiO2 substrates and its effect on the laser-induced damage threshold (LIDT). The crystallization process was studied using in-situ X-ray diffractometry. We determined an activation energy for crystallization of 2.6 ± 0.5 eV. It was found that the growth of the crystallites follows a two-dimensional growth mode. This, in combination with the high activation energy, leads to an apparent layer thickness-dependent crystallization temperature. LIDT measurements @355 nm on thermally treated 3 quarter-wave thick hafnia layers show a decrement of the 0% LIDT for 1 h @773 K treatment. Thermal treatment for 5 h leads to a significant increment of the LIDT values.

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“…Laser-damage testing was performed using a Litron LPYG-450-100 diode-pumped laser at 355 nm [26]. The repetition rate was 100 Hz, while the pulse duration was 11.6 ns.…”

Section: Laser-damage Testingmentioning

confidence: 99%

Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold

Balogh-Michels

Stevanovic

Borzì³

et al. 2021

J. Eur. Opt. Soc.-Rapid Publ.

Self Cite

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“…The measurement of the LIDT was performed at the laser damage test bench located at the RhySearch optical coating laboratory [17,18]. Herewith the fused silica substrates coated with 480 nm HfO 2 at 100 • C and different applied second ion beam parameters were laser damage-tested.…”

Section: Optical Properties and Laser-induced Damage Testingmentioning

confidence: 99%

Influence of the Secondary Ion Beam Source on the Laser Damage Mechanism and Stress Evolution of IBS Hafnia Layers

et al. 2020

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Ion beam sputtered hafnia is a preferred high index coating material for laser applications. It exhibits a mostly amorphous structure and an adequate laser-induced damage (LIDT) threshold. In this work, we investigated the influence of an assisting ion source on the film stress as well as the LIDT of the sputtered hafnia layers. The stress increases with an increasing ion energy of the assisting ion beam. We identified a maximum compressive stress of 3–3.5 GPa before the film cracks, blisters, and delaminates. Different states of stress lead to different laser-induced damage thresholds and damage morphologies.

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Influence of ultra-sonic frequency during substrate cleaning on the laser resistance of antireflection coatings

Cited by 2 publications

References 4 publications

Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold

Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold

Influence of the Secondary Ion Beam Source on the Laser Damage Mechanism and Stress Evolution of IBS Hafnia Layers

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