2013
DOI: 10.1016/j.tsf.2012.11.137
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Influence of titanium-substrate roughness on Ca–P–O thin films grown by atomic layer deposition

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Cited by 6 publications
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“…1 This comes at the expense of very slow growth (typically in the order of 1 Å /cycle), making ALD most suitable for very thin films. Although many different ALD processes have been developed for various classes of materials such as oxides, ii-vi and iii-v semiconductors, metal nitrides, metals, metal sulfides, and fluorides, 2 the existing reports on ALD of phosphates are still limited, [3][4][5][6][7][8][9][10][11][12][13] but have recently been increasing in number because of their relevance as electrode [14][15][16][17][18] or electrolyte [19][20][21][22] films in lithium-ion batteries.…”
Section: Introductionmentioning
confidence: 99%
“…1 This comes at the expense of very slow growth (typically in the order of 1 Å /cycle), making ALD most suitable for very thin films. Although many different ALD processes have been developed for various classes of materials such as oxides, ii-vi and iii-v semiconductors, metal nitrides, metals, metal sulfides, and fluorides, 2 the existing reports on ALD of phosphates are still limited, [3][4][5][6][7][8][9][10][11][12][13] but have recently been increasing in number because of their relevance as electrode [14][15][16][17][18] or electrolyte [19][20][21][22] films in lithium-ion batteries.…”
Section: Introductionmentioning
confidence: 99%