2019
DOI: 10.1007/s42452-019-0497-1
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Influence of the Zn plasma kinetics on the structural and optical properties of ZnO thin films grown by PLD

Abstract: We analyze the effect of the average kinetic energy of Zn ions on the crystalline orientation and quality, along with its effect on the optical response of ZnO thin films deposited by reactive pulsed laser deposition. With the use of laser attenuators, the Zn plasma density was kept constant while the mean kinetic ion energy was varied from 40 to 100 eV. The results show that the films are polycrystalline with a preferential orientation along the [101] direction. As the mean kinetic energy of the ions in the p… Show more

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Cited by 11 publications
(3 citation statements)
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References 39 publications
(65 reference statements)
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“…This change in orientation was also noted by Ayana et al [39]in ZnO thin films produced using spray pyrolysis on p-type Si substrate. Similarly, Leon et al [40] conducted experiments depositing ZnO on Si and glass substrates using PLD, where they adjusted deposition parameters to achieve films oriented exclusively in the (101) direction without any presence of (002). Fujimura et al [41] calculated surface energy density values for different orientations, with (002), (110), and (100) measuring 9.9, 12.3, and 20.9 eV nm −2 , respectively.…”
Section: Structural Propertiesmentioning
confidence: 99%
“…This change in orientation was also noted by Ayana et al [39]in ZnO thin films produced using spray pyrolysis on p-type Si substrate. Similarly, Leon et al [40] conducted experiments depositing ZnO on Si and glass substrates using PLD, where they adjusted deposition parameters to achieve films oriented exclusively in the (101) direction without any presence of (002). Fujimura et al [41] calculated surface energy density values for different orientations, with (002), (110), and (100) measuring 9.9, 12.3, and 20.9 eV nm −2 , respectively.…”
Section: Structural Propertiesmentioning
confidence: 99%
“…However, the selection of the synthesis method depends on the specific requirements of the application, the desired thickness, uniformity of the film, and surface states, as well as the equipment and resources available. Sputtering, Molecular Beam Epitaxy (MBE), Pulse Laser Deposition (PLD), and Metal-Organic Chemical Vapor Deposition (MOCVD) are considered as complicated and expensive methods, which involve sophisticated experimental apparatus and specific conditions [27][28][29][30][31][32]. Soft chemistry methods such as spray pyrolysis, dip-and spin-coating, and electrodeposition are regarded as relatively easy and inexpensive techniques [33][34][35][36][37].…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, it can also be applied in gas sensors, catalysts and solar cells due to its larger ration of length to diameter. It is noted that semiconductors such as ZnO, SnS 2 , TiO 2 could well be used in the field of photocatatalysis, and present an outstanding property [20][21][22][23][24][25].…”
Section: Introductionmentioning
confidence: 99%